Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 6482573 | Exposure correction based on reflective index for photolithographic process control | Jayendra D. Bhakta, Zicheng Gary Ling, Weizhong Wang, Eric Kent | 2002-11-19 | $1,532,000 |
| 6345209 | Method of using critical dimension mapping to qualify a new integrated circuit manufacturing process | — | 2002-02-05 | $5,814,000 |
| 6345210 | Method of using critical dimension mapping to qualify a reticle used in integrated circuit fabrication | — | 2002-02-05 | $5,814,000 |
| 6345211 | Method of using critical dimension mapping to optimize speed performance of microprocessor produced using an integrated circuit manufacturing process | — | 2002-02-05 | $5,814,000 |
| 6238936 | Method of using critical dimension mapping to qualify a new integrated circuit fabrication etch process | — | 2001-05-29 | $6,079,000 |
| 6215127 | Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set | — | 2001-04-10 | $6,300,000 |