Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10296681 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang +3 more | 2019-05-21 |
| 10007744 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang +3 more | 2018-06-26 |
| 9804504 | Method and apparatus for design of a metrology target | Guangqing Chen, Jen-Shiang Wang, Omer Abubaker Omer Adam | 2017-10-31 |
| 9355200 | Method and apparatus for design of a metrology target | Guangqing Chen, Jen-Shiang Wang, Omer Abubaker Omer Adam | 2016-05-31 |
| 6529623 | Stepper lens specific reticle compensation for critical dimension control | — | 2003-03-04 |
| 6482573 | Exposure correction based on reflective index for photolithographic process control | Jayendra D. Bhakta, Zicheng Gary Ling, Weizhong Wang, Warren T. Yu | 2002-11-19 |
| 6418946 | Apparatus for automatically cleaning resist nozzle | Vincent L. Marinaro, Ted Wakamiya | 2002-07-16 |
| 6368985 | Dual track/stepper interface configuration for wafer processing | Ted Wakamiya, Vince L. Marinaro | 2002-04-09 |
| 6361599 | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Vincent L. Marinaro | 2002-03-26 |
| 6360959 | Dual resist dispense nozzle for wafer tracks | Vince L. Marinaro, Ted Wakamiya | 2002-03-26 |
| 6336960 | System and method for purging air bubbles from filters | Vince L. Marinaro, Ted Wakamiya | 2002-01-08 |
| 6318913 | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Ted Wakamiya, Vincent L. Marinaro | 2001-11-20 |
| 6299688 | Developer nozzle clean combs | Vincent L. Marinaro | 2001-10-09 |
| 6250822 | Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer | Ted Wakamiya, Vincent L. Marinaro | 2001-06-26 |
| 6245584 | Method for detecting adjustment error in photolithographic stepping printer | Vincent L. Marinaro | 2001-06-12 |
| 6238747 | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Vincent L. Marinaro | 2001-05-29 |
| 6170494 | Method for automatically cleaning resist nozzle | Vincent L. Marinaro, Ted Wakamiya | 2001-01-09 |
| 6130016 | Method for forming semiconductor structures using a calibrating reticle | — | 2000-10-10 |
| 6082379 | Mechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperature | Vincent L. Marinaro | 2000-07-04 |
| 6051348 | Method for detecting malfunction in photolithographic fabrication track | Vincent L. Marinaro | 2000-04-18 |