Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer

Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer

US Patent 6318913 · Granted Nov 20, 2001

Estimated economic value: $3,380,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process based metrology target design2019
Process based metrology target design2018
Method and apparatus for design of a metrology target2017
Method and apparatus for design of a metrology target2016
Apparatus to reduce wasting of unused photoresist in semiconductor containers2003
Apparatus to reduce wasting of unused photoresist in semiconductor containers2003
Stepper lens specific reticle compensation for critical dimension control2003
Temperature control unit and sight glass2002
Temperature control unit and sight glass2002
Exposure correction based on reflective index for photolithographic process cont2002
Apparatus for automatically cleaning resist nozzle2002
Apparatus for automatically cleaning resist nozzle2002