Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process based metrology target design

Process based metrology target design

US Patent 10007744 · Granted Jun 26, 2018

Estimated economic value: $25,084,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for training or using a process model for determining a pattern in a patt2025
Etch bias characterization and method of using the same2025
Identification of hot spots or defects by machine learning2025
Determining hot spot ranking based on wafer measurement2025
Training methods for machine learning assisted optical proximity error2025
Method and apparatus for inspection and metrology2025
Method and apparatus for inspection and metrology2025
Utilize machine learning in selecting high quality averaged SEM images from raw 2024
Method to predict yield of a device manufacturing process2024
Method of manufacturing devices2024
Determining pattern ranking based on measurement feedback from printed substrate2024
Method for improving a process for a patterning process2024