AB

Ashish Bodke

IN Intermolecular: 8 patents #72 of 248Top 30%
Applied Materials: 4 patents #2,506 of 7,310Top 35%
Globalfoundries: 4 patents #817 of 4,424Top 20%
The Dow Chemical: 1 patents #2,215 of 4,115Top 55%
Overall (All Time): #297,972 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9455393 Low temperature deposition of low loss dielectric layers in superconducting circuits Frank Greer, Mark Clark 2016-09-27
9399812 Methods of preventing plasma induced damage during substrate processing Zhigang Xie, Mei Chang 2016-07-26
9368721 Diamond like carbon (DLC) as a thermal sink in a selector stack for non-volatile memory application Mark Clark, Kevin Kashefi, Prashant B. Phatak 2016-06-14
9362283 Gate structures for transistor devices for CMOS applications and products Zhendong Hong, Susie Tzeng, Amol Joshi, Divya Pisharoty, Usha Raghuram +6 more 2016-06-07
9337238 Photo-induced MSM stack Kevin Kashefi, Mark Clark, Prashant B. Phatak, Dipankar Pramanik 2016-05-10
9297775 Combinatorial screening of metallic diffusion barriers Edwin Adhiprakasha, Sean Barstow, Zhendong Hong, Usha Raghuram, Karthik Ramani +3 more 2016-03-29
9246092 Tunneling barrier creation in MSM stack as a selector device for non-volatile memory application Mark Clark, Kevin Kashefi, Prashant B. Phatak, Dipankar Pramanik 2016-01-26
9236261 Deposition of titanium-aluminum layers Kevin Kashefi 2016-01-12
9196475 Methods for fabricating integrated circuits including fluorine incorporation Bongki Lee, Paul R. Besser, Kevin Kashefi, Olov Karlsson, Ratsamee Limdulpaiboon +2 more 2015-11-24
9105497 Methods of forming gate structures for transistor devices for CMOS applications Zhendong Hong, Susie Tzeng, Amol Joshi, Divya Pisharoty, Usha Raghuram +6 more 2015-08-11
9059156 Method of forming an erbium silicide metal gate stack FinFET device via a physical vapor deposition nanolaminate approach Zhendong Hong, Olov Karlsson 2015-06-16
8945414 Oxide removal by remote plasma treatment with fluorine and oxygen radicals Jingang Su, Abhijit Pethe, J Watanabe 2015-02-03
8168543 Methods of forming a layer for barrier applications in an interconnect structure Xinyu Fu, Keyvan Kashefizadeh, Winsor Lam, Yiochiro Tanaka, Wonwoo Kim 2012-05-01
7846824 Methods for forming a titanium nitride layer Keyvan Kashefizadeh, Zhigang Xie, Mei Chang 2010-12-07
7618893 Methods of forming a layer for barrier applications in an interconnect structure Xinyu Fu, Keyvan Kashefizadeh, Winsor Lam, Yiochiro Tanaka, Wonwoo Kim 2009-11-17
6365543 Process for the production of an oxidation catalyst on-line Lanny D. Schmidt 2002-04-02