Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406849 | Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition | Takashi Kuratomi, I-Cheng Chen, Avgerinos V. Gelatos, Pingyan Lei, Xianmin Tang | 2025-09-02 |
| 11887855 | Methods for depositing fluorine/carbon-free conformal tungsten | Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more | 2024-01-30 |
| 11658014 | Apparatuses and methods of protecting nickel and nickel containing components with thin films | Pingyan Lei, Dien-Yeh Wu, Xiao-Ming He, Jennifer Y. Sun, Lei Zhou +3 more | 2023-05-23 |
| 11598003 | Substrate processing chamber having heated showerhead assembly | Faruk Gungor, Dien-Yeh Wu, Joel M. Huston, Xiaoxiong Yuan, Kazuya Daito +4 more | 2023-03-07 |
| 11530478 | Method for forming a hydrophobic and icephobic coating | Rajeev Bajaj, Deenesh Padhi | 2022-12-20 |
| 11430661 | Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition | Takashi Kuratomi, I-Cheng Chen, Avgerinos V. Gelatos, Pingyan Lei, Xianmin Tang | 2022-08-30 |
| 11355391 | Method for forming a metal gapfill | Xi Cen, Feiyue Ma, Kai Wu, Yu Lei, Kazuya Daito +13 more | 2022-06-07 |
| 11133155 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more | 2021-09-28 |
| 11033930 | Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition | Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou +3 more | 2021-06-15 |
| 11018009 | Tuning work function of p-metal work function films through vapor deposition | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Paul F. Ma, Yixiong Yang +1 more | 2021-05-25 |
| 10985023 | Methods for depositing fluorine/carbon-free conformal tungsten | Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more | 2021-04-20 |
| 10879081 | Methods of reducing or eliminating defects in tungsten film | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Paul F. Ma, Kai Wu +4 more | 2020-12-29 |
| 10763090 | High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process | Adolph Miller Allen, Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang +8 more | 2020-09-01 |
| 10640870 | Gas feedthrough assembly | Daping Yao, Hyman Lam, Jiang Lu, Dien-Yeh Wu, Can Xu +1 more | 2020-05-05 |
| 10600685 | Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film | Daping Yao, Jiang Lu, Can Xu, Paul F. Ma | 2020-03-24 |
| 10553425 | Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD | Jessica S. Kachian, Naomi Yoshida, Mary Edmonds, Andrew C. Kummel, Sang Wook Park +1 more | 2020-02-04 |
| 10535527 | Methods for depositing semiconductor films | Yi Xu, Takashi Kuratomi, Avgerinos V. Gelatos, Vikash Banthia, Kazuya Daito | 2020-01-14 |
| 10453657 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more | 2019-10-22 |
| 10400335 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Chien-Teh Kao, Joel M. Huston | 2019-09-03 |
| 10395916 | In-situ pre-clean for selectivity improvement for selective deposition | Kai Wu, Vikash Banthia, Sang Ho Yu, Feiyue Ma | 2019-08-27 |
| 10373824 | CVD silicon monolayer formation method and gate oxide ALD formation on semiconductor materials | Andrew C. Kummel, Mary Edmonds, Jessica S. Kachian | 2019-08-06 |
| 10283345 | Methods for pre-cleaning conductive materials on a substrate | Xiangjin Xie, Feng Q. Liu, Daping Yao, Alexander Jansen, Joung Joo Lee +2 more | 2019-05-07 |
| 10121671 | Methods of depositing metal films using metal oxyhalide precursors | Xinyu Fu, David Knapp, David Thompson, Jeffrey W. Anthis | 2018-11-06 |
| 10109534 | Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) | Adam Brand, Naomi Yoshida, Seshadri Ganguli, David Thompson | 2018-10-23 |
| 10094023 | Methods and apparatus for chemical vapor deposition of a cobalt layer | Sang Ho Yu | 2018-10-09 |