Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9947578 | Methods for forming low-resistance contacts through integrated process flow systems | Yu Lei, Vikash Banthia, Kai Wu, Xinyu Fu, Yi Xu +9 more | 2018-04-17 |
| 9857027 | Apparatus and method for self-regulating fluid chemical delivery | Martin Jeff Salinas, Youqun Dong, David Thompson | 2018-01-02 |
| 9833029 | Method of forming three-dimensional electronic mannequin | Li-Ching Chang | 2017-12-05 |
| 9824889 | CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials | Andrew C. Kummel, Mary Edmonds, Jessica S. Kachian | 2017-11-21 |
| 9653318 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | David T. Or, Joshua Collins | 2017-05-16 |
| 9601339 | Methods for depositing fluorine/carbon-free conformal tungsten | Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more | 2017-03-21 |
| 9595466 | Methods for etching via atomic layer deposition (ALD) cycles | Xinyu Fu, Srinivas Gandikota, Seshadri Ganguli, Guoqiang Jian, Yixiong Yang +2 more | 2017-03-14 |
| 9552968 | Plasma cleaning apparatus and method | Martin Deehan, Matt Cheng-Hsiung Tsai, Nan Lu, David T. Or | 2017-01-24 |
| 9460959 | Methods for pre-cleaning conductive interconnect structures | Xiangjin Xie, Feng Q. Liu, Daping Yao, Alexander Jansen, Joung Joo Lee +2 more | 2016-10-04 |
| 9418890 | Method for tuning a deposition rate during an atomic layer deposition process | Paul F. Ma, Joseph AuBuchon, Jiang Lu | 2016-08-16 |
| 9399812 | Methods of preventing plasma induced damage during substrate processing | Ashish Bodke, Zhigang Xie | 2016-07-26 |
| 9245769 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | David T. Or, Joshua Collins | 2016-01-26 |
| 9202745 | Directional SiO2 etch using low-temperature etchant deposition and plasma post-treatment | David T. Or, Joshua Collins | 2015-12-01 |
| 9177780 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | David T. Or, Joshua Collins | 2015-11-03 |
| 9147578 | Contact clean by remote plasma and repair of silicide surface | Xinliang Lu, Chien-Teh Kao, Chiukin Lai | 2015-09-29 |
| 9082828 | Al bond pad clean method | — | 2015-07-14 |
| 9048183 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2015-06-02 |
| 8642468 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2014-02-04 |