WT

Wei V. Tang

Applied Materials: 32 patents #342 of 7,310Top 5%
Overall (All Time): #110,734 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 25 most recent of 32 patents

Patent #TitleCo-InventorsDate
12387975 Thermal process chamber lid with backside pumping Anqing Cui, Dien-Yeh Wu, Yixiong Yang, Bo Wang 2025-08-12
12328872 Liner for V-NAND word line stack Jacqueline S. Wrench, Yixiong Yang, Yong Wu, Srinivas Gandikota, Yongjing Lin +2 more 2025-06-10
11894233 Electronic device having an oxygen free platinum group metal film Yixiong Yang, Seshadri Ganguli, Sang Ho Yu, Feng Q. Liu, Jeffrey W. Anthis +3 more 2024-02-06
11732358 High temperature chemical vapor deposition lid Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota 2023-08-22
11715667 Thermal process chamber lid with backside pumping Anqing Cui, Dien-Yeh Wu, Yixiong Yang, Bo Wang 2023-08-01
11646226 Method of tuning film properties of metal nitride using plasma Wenyi Liu, Srinivas Gandikota, Yixiong Yang, Yong Wu, Jianqiu GUO +2 more 2023-05-09
11623253 In-situ DC plasma for cleaning pedestal heater Tejas Ulavi, Arkaprava Dan, Sanjeev Baluja 2023-04-11
11488830 Oxygen free deposition of platinum group metal films Yixiong Yang, Seshadri Ganguli, Sang Ho Yu, Feng Q. Liu, Jeffrey W. Anthis +3 more 2022-11-01
11476267 Liner for V-NAND word line stack Jacqueline S. Wrench, Yixiong Yang, Yong Wu, Srinivas Gandikota, Yongjing Lin +2 more 2022-10-18
11447866 High temperature chemical vapor deposition lid Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota 2022-09-20
11335591 Thermal process chamber lid with backside pumping Anqing Cui, Dien-Yeh Wu, Yixiong Yang, Bo Wang 2022-05-17
11260432 In-situ DC plasma for cleaning pedestal heater Tejas Ulavi, Arkaprava Dan, Sanjeev Baluja 2022-03-01
11171047 Fluorine-doped nitride films for improved high-k reliability Yixiong Yang, Srinivas Gandikota, Steven C. H. Hung, Jacqueline S. Wrench, Yongjing Lin +2 more 2021-11-09
11075276 Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu +5 more 2021-07-27
11018009 Tuning work function of p-metal work function films through vapor deposition Guoqiang Jian, Chi-Chou Lin, Paul F. Ma, Yixiong Yang, Mei Chang +1 more 2021-05-25
10991586 In-situ tungsten deposition without barrier layer Yong Wu, Jianqiu GUO, Wenyi Liu, Yixiong Yang, Jacqueline S. Wrench +3 more 2021-04-27
10879081 Methods of reducing or eliminating defects in tungsten film Guoqiang Jian, Chi-Chou Lin, Paul F. Ma, Kai Wu, Vikash Banthia +4 more 2020-12-29
10755947 Methods of increasing selectivity for selective etch processes Wenyu Zhang, Yixiong Yang, Mario D. Sanchez, Guoqiang Jian, Paul F. Ma 2020-08-25
10665450 Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films Yixiong Yang, Paul F. Ma, Wenyu Zhang, Shih Chung Chen, CHEN-HAN LIN +6 more 2020-05-26
10636705 High pressure annealing of metal gate structures Yifei Wang, Kurtis Leschkies, Fei Wang, Xin Liu, Yixiong Yang +2 more 2020-04-28
10407771 Atomic layer deposition chamber with thermal lid Anqing Cui, Faruk Gungor, Dien-Yeh Wu, Vikas Jangra, Muhammad M. Rasheed +6 more 2019-09-10
10347488 Titanium compound based hard mask films Rui Cheng, Pramit Manna, Abhijit Basu Mallick, Srinivas Gandikota 2019-07-09
10170321 Aluminum content control of TiAIN films Wenyu Zhang, Yixiong Yang, CHEN-HAN LIN, Yi Xu, Yu Lei +8 more 2019-01-01
10014185 Selective etch of metal nitride films Liqi Wu, Wenyu Zhang, Shih Chung Chen, Leung Kway Lee, Xinming Zhang +1 more 2018-07-03
9947578 Methods for forming low-resistance contacts through integrated process flow systems Yu Lei, Vikash Banthia, Kai Wu, Xinyu Fu, Yi Xu +9 more 2018-04-17