| 12387946 |
Double-sided scrubber for substrate cleaning |
Al Stone |
2025-08-12 |
|
| 12023853 |
Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
Kasiraman Krishnan, Daniel Redfield, Russell Edward Perry, Gregory E. Menk, Fred C. Redeker +3 more |
2024-07-02 |
$85,126,000 |
| 12011801 |
Printing a chemical mechanical polishing pad |
Barry Chin, Terrance Y. Lee |
2024-06-18 |
$83,264,000 |
| 11986922 |
Techniques for combining CMP process tracking data with 3D printed CMP consumables |
Jason Garcheung Fung, Daniel Redfield, Aniruddh Jagdish Khanna, Mario CORNEJO, Gregory E. Menk +1 more |
2024-05-21 |
$57,593,000 |
| 11980992 |
Integrated abrasive polishing pads and manufacturing methods |
Ashavani Kumar, Ashwin CHOCKALINGAM, Sivapackia Ganapathiappan, Boyi Fu, Daniel Redfield +6 more |
2024-05-14 |
$61,768,000 |
| 11964359 |
Apparatus and method of forming a polishing article that has a desired zeta potential |
Ashwin Chockalingham, Mahendra C. ORILALL, Mayu YAMAMURA, Boyi Fu, Daniel Redfield |
2024-04-23 |
$64,043,000 |
| 11965103 |
Additive manufacturing of polishing pads |
Yingdong Luo, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daihua Zhang, Uma Sridhar +4 more |
2024-04-23 |
$64,043,000 |
| 11958162 |
CMP pad construction with composite material properties using additive manufacturing processes |
Kasiraman Krishnan, Mahendra C. ORILALL, Daniel Redfield, Fred C. Redeker, Nag B. Patibandla +4 more |
2024-04-16 |
$82,852,000 |
| 11951590 |
Polishing pads with interconnected pores |
Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Ashwin CHOCKALINGAM, Jason Garcheung Fung, Veera Raghava Reddy Kakireddy, Nandan BARADANAHALLI KENCHAPPA +1 more |
2024-04-09 |
$47,694,000 |
| 11911870 |
Polishing pads for high temperature processing |
Sivapackia Ganapathiappan, Yingdong Luo, Aniruddh Jagdish Khanna, You Wang, Daniel Redfield |
2024-02-27 |
$57,915,000 |
| 11897079 |
Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity |
Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown +2 more |
2024-02-13 |
$47,589,000 |
| 11878389 |
Structures formed using an additive manufacturing process for regenerating surface texture in situ |
Puneet Narendra JAWALI, Veera Raghava Reddy Kakireddy, Daniel Redfield |
2024-01-23 |
$48,508,000 |
| 11851570 |
Anionic polishing pads formed by printing processes |
Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Yingdong Luo, Daniel Redfield +3 more |
2023-12-26 |
$30,871,000 |
| 11826876 |
Hydrophilic and zeta potential tunable chemical mechanical polishing pads |
Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Ankit Vora, Daniel Redfield +3 more |
2023-11-28 |
$39,424,000 |
| 11813712 |
Polishing pads having selectively arranged porosity |
Aniruddh Jagdish Khanna, Jason Garcheung Fung, Puneet Narendra JAWALI, Adam W. Manzonie, Nandan BARADANAHALLI KENCHAPPA +4 more |
2023-11-14 |
$33,075,000 |
| 11806829 |
Advanced polishing pads and related polishing pad manufacturing methods |
Puneet Narendra JAWALI, Nandan BARADANAHALLI KENCHAPPA, Jason Garcheung Fung, Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Adam W. Manzonie +1 more |
2023-11-07 |
$37,048,000 |
| 11772229 |
Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more |
2023-10-03 |
$34,462,000 |
| 11745302 |
Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more |
2023-09-05 |
$42,922,000 |
| 11724362 |
Polishing pads produced by an additive manufacturing process |
Daniel Redfield, Mahendra C. ORILALL, Boyi Fu, Aniruddh Jagdish Khanna, Jason Garcheung Fung +5 more |
2023-08-15 |
$42,730,000 |
| 11685014 |
Formulations for advanced polishing pads |
Sivapackia Ganapathiappan, Ankit Vora, Boyi Fu, Venkat Hariharan, Mayu YAMAMURA +5 more |
2023-06-27 |
$59,089,000 |
| 11673225 |
Printing a chemical mechanical polishing pad |
Barry Chin, Terrance Y. Lee |
2023-06-13 |
$42,513,000 |
| 11638979 |
Additive manufacturing of polishing pads |
Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daniel Redfield, Mayu YAMAMURA +2 more |
2023-05-02 |
$66,273,000 |
| 11612978 |
Additive manufacturing of polishing pads |
Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Mayu YAMAMURA, Daniel Redfield +2 more |
2023-03-28 |
$69,791,000 |
| 11597054 |
Correction of fabricated shapes in additive manufacturing |
Mayu YAMAMURA, Jason Garcheung Fung, Daniel Redfield, Hou T. Ng |
2023-03-07 |
$32,704,000 |
| 11597052 |
Temperature control of chemical mechanical polishing |
Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang, Jeonghoon Oh +1 more |
2023-03-07 |
$32,704,000 |
