Issued Patents All Time
Showing 25 most recent of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387946 | Double-sided scrubber for substrate cleaning | Al Stone | 2025-08-12 |
| 12023853 | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles | Kasiraman Krishnan, Daniel Redfield, Russell Edward Perry, Gregory E. Menk, Fred C. Redeker +3 more | 2024-07-02 |
| 12011801 | Printing a chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2024-06-18 |
| 11986922 | Techniques for combining CMP process tracking data with 3D printed CMP consumables | Jason Garcheung Fung, Daniel Redfield, Aniruddh Jagdish Khanna, Mario CORNEJO, Gregory E. Menk +1 more | 2024-05-21 |
| 11980992 | Integrated abrasive polishing pads and manufacturing methods | Ashavani Kumar, Ashwin CHOCKALINGAM, Sivapackia Ganapathiappan, Boyi Fu, Daniel Redfield +6 more | 2024-05-14 |
| 11964359 | Apparatus and method of forming a polishing article that has a desired zeta potential | Ashwin Chockalingham, Mahendra C. ORILALL, Mayu YAMAMURA, Boyi Fu, Daniel Redfield | 2024-04-23 |
| 11965103 | Additive manufacturing of polishing pads | Yingdong Luo, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daihua Zhang, Uma Sridhar +4 more | 2024-04-23 |
| 11958162 | CMP pad construction with composite material properties using additive manufacturing processes | Kasiraman Krishnan, Mahendra C. ORILALL, Daniel Redfield, Fred C. Redeker, Nag B. Patibandla +4 more | 2024-04-16 |
| 11951590 | Polishing pads with interconnected pores | Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Ashwin CHOCKALINGAM, Jason Garcheung Fung, Veera Raghava Reddy Kakireddy, Nandan BARADANAHALLI KENCHAPPA +1 more | 2024-04-09 |
| 11911870 | Polishing pads for high temperature processing | Sivapackia Ganapathiappan, Yingdong Luo, Aniruddh Jagdish Khanna, You Wang, Daniel Redfield | 2024-02-27 |
| 11897079 | Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity | Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Brian J. Brown +2 more | 2024-02-13 |
| 11878389 | Structures formed using an additive manufacturing process for regenerating surface texture in situ | Puneet Narendra JAWALI, Veera Raghava Reddy Kakireddy, Daniel Redfield | 2024-01-23 |
| 11851570 | Anionic polishing pads formed by printing processes | Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Yingdong Luo, Daniel Redfield +3 more | 2023-12-26 |
| 11826876 | Hydrophilic and zeta potential tunable chemical mechanical polishing pads | Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Ankit Vora, Daniel Redfield +3 more | 2023-11-28 |
| 11813712 | Polishing pads having selectively arranged porosity | Aniruddh Jagdish Khanna, Jason Garcheung Fung, Puneet Narendra JAWALI, Adam W. Manzonie, Nandan BARADANAHALLI KENCHAPPA +4 more | 2023-11-14 |
| 11806829 | Advanced polishing pads and related polishing pad manufacturing methods | Puneet Narendra JAWALI, Nandan BARADANAHALLI KENCHAPPA, Jason Garcheung Fung, Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Adam W. Manzonie +1 more | 2023-11-07 |
| 11772229 | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process | Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more | 2023-10-03 |
| 11745302 | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process | Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more | 2023-09-05 |
| 11724362 | Polishing pads produced by an additive manufacturing process | Daniel Redfield, Mahendra C. ORILALL, Boyi Fu, Aniruddh Jagdish Khanna, Jason Garcheung Fung +5 more | 2023-08-15 |
| 11685014 | Formulations for advanced polishing pads | Sivapackia Ganapathiappan, Ankit Vora, Boyi Fu, Venkat Hariharan, Mayu YAMAMURA +5 more | 2023-06-27 |
| 11673225 | Printing a chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2023-06-13 |
| 11638979 | Additive manufacturing of polishing pads | Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Daniel Redfield, Mayu YAMAMURA +2 more | 2023-05-02 |
| 11612978 | Additive manufacturing of polishing pads | Uma Sridhar, Sivapackia Ganapathiappan, Ashwin CHOCKALINGAM, Mayu YAMAMURA, Daniel Redfield +2 more | 2023-03-28 |
| 11597054 | Correction of fabricated shapes in additive manufacturing | Mayu YAMAMURA, Jason Garcheung Fung, Daniel Redfield, Hou T. Ng | 2023-03-07 |
| 11597052 | Temperature control of chemical mechanical polishing | Hari Soundararajan, Shou-Sung Chang, Haosheng Wu, Jianshe Tang, Jeonghoon Oh +1 more | 2023-03-07 |