Issued Patents All Time
Showing 25 most recent of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12392427 | Insulated fluid lines in chemical mechanical polishing | Chad Pollard, Hari Soundararajan, Paul D. Butterfield, Haosheng Wu, Calvin Spencer Lee +1 more | 2025-08-19 |
| 12318882 | Apparatus and method for CMP temperature control | Hari Soundararajan, Haosheng Wu, Jianshe Tang | 2025-06-03 |
| 12296427 | Apparatus and method for CMP temperature control | Haosheng Wu, Chih Chung Chou, Jianshe Tang, Hui Chen, Hari Soundararajan +1 more | 2025-05-13 |
| 12290896 | Apparatus and method for CMP temperature control | Hari Soundararajan, Haosheng Wu, Jianshe Tang | 2025-05-06 |
| 12290897 | Fluid-tight electrical connection techniques for semiconductor processing | Chad Pollard, Haosheng Wu | 2025-05-06 |
| 12214468 | Temperature control of chemical mechanical polishing | Haosheng Wu, Hari Soundararajan, Yen-Chu Yang, Jianshe Tang, Shih-Haur Shen +1 more | 2025-02-04 |
| 12106976 | Steam-assisted single substrate cleaning process and apparatus | Jianshe Tang, Wei Lu, Haosheng Wu, Taketo Sekine, Hari Soundararajan +1 more | 2024-10-01 |
| 12030093 | Steam treatment stations for chemical mechanical polishing system | Haosheng Wu, Jianshe Tang, Hari Soundararajan, Hui Chen, Chih Chung Chou +2 more | 2024-07-09 |
| 11986926 | Slurry distribution device for chemical mechanical polishing | Yen-Chu Yang, Stephen Jew, Jianshe Tang, Haosheng Wu, Paul D. Butterfield +2 more | 2024-05-21 |
| 11919123 | Apparatus and method for CMP temperature control | Surajit Kumar, Hari Soundararajan, Hui Chen | 2024-03-05 |
| 11897079 | Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity | Haosheng Wu, Hari Soundararajan, Jianshe Tang, Brian J. Brown, Yen-Chu Yang +2 more | 2024-02-13 |
| 11865671 | Temperature-based in-situ edge assymetry correction during CMP | Haosheng Wu, Jianshe Tang, Chih Chung Chou, Hui Chen, Hari Soundararajan +1 more | 2024-01-09 |
| 11833637 | Control of steam generation for chemical mechanical polishing | Hari Soundararajan, Calvin Spencer Lee, Jonathan P. Domin, Shuchivrat Datar, Dmitry Sklyar +3 more | 2023-12-05 |
| 11826872 | Temperature and slurry flow rate control in CMP | Haosheng Wu, Jianshe Tang, Brian J. Brown, Shih-Haur Shen, Hari Soundararajan | 2023-11-28 |
| 11819976 | Spray system for slurry reduction during chemical mechanical polishing (cmp) | Chih Chung Chou, Anand N. Iyer, Ekaterina A. Mikhaylichenko, Christopher Heung-Gyun Lee, Erik S. Rondum +1 more | 2023-11-21 |
| 11806835 | Slurry distribution device for chemical mechanical polishing | Yen-Chu Yang, Stephen Jew, Jianshe Tang, Haosheng Wu, Paul D. Butterfield +2 more | 2023-11-07 |
| 11780046 | Polishing system with annular platen or polishing pad | Paul D. Butterfield, Thomas H. Osterheld, Jeonghoon Oh, Steven M. Zuniga, Fred C. Redeker | 2023-10-10 |
| 11752589 | Chemical mechanical polishing temperature scanning apparatus for temperature control | Hari Soundararajan, Haosheng Wu, Jianshe Tang | 2023-09-12 |
| 11728185 | Steam-assisted single substrate cleaning process and apparatus | Jianshe Tang, Wei Lu, Haosheng Wu, Taketo Sekine, Hari Soundararajan +1 more | 2023-08-15 |
| 11697187 | Temperature-based assymetry correction during CMP and nozzle for media dispensing | Haosheng Wu, Jianshe Tang, Chih Chung, Hui Chen, Hari Soundararajan +1 more | 2023-07-11 |
| 11633833 | Use of steam for pre-heating of CMP components | Haosheng Wu, Jianshe Tang, Hari Soundararajan, Paul D. Butterfield, Hui Chen +2 more | 2023-04-25 |
| 11628478 | Steam cleaning of CMP components | Haosheng Wu, Jianshe Tang, Hari Soundararajan, Hui Chen, Chih Chung Chou +2 more | 2023-04-18 |
| 11597052 | Temperature control of chemical mechanical polishing | Hari Soundararajan, Haosheng Wu, Jianshe Tang, Jeonghoon Oh, Rajeev Bajaj +1 more | 2023-03-07 |
| 11577358 | Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing | Surajit Kumar, Hui Chen, Chih Chung Chou | 2023-02-14 |
| 11511388 | Polishing system with support post and annular platen or polishing pad | Paul D. Butterfield, Thomas H. Osterheld, Jeonghoon Oh, Steven M. Zuniga, Fred C. Redeker | 2022-11-29 |