| 12491603 |
Passive acoustic monitoring and acoustic sensors for chemical mechanical polishing |
Nicholas A. Wiswell, Sohrab Pourmand, Dominic J. Benvegnu, Boguslaw A. Swedek |
2025-12-09 |
|
| 12479062 |
Determining substrate orientation with acoustic signals |
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian |
2025-11-25 |
|
| 12447579 |
Chemical mechanical polishing vibration measurement using optical sensor |
Jeong-Il Oh, Steven M. Zuniga |
2025-10-21 |
|
| 12403560 |
Determining substrate precession with acoustic signals |
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian |
2025-09-02 |
|
| 12343840 |
Control of processing parameters for substrate polishing with substrate precession |
Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Benjamin Cherian +1 more |
2025-07-01 |
|
| 12257665 |
Machine vision as input to a CMP process control algorithm |
Benjamin Cherian, Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek |
2025-03-25 |
|
| 12020159 |
Training spectrum generation for machine learning system for spectrographic monitoring |
Benjamin Cherian, Nicholas A. Wiswell, Jun Qian |
2024-06-25 |
$57,214,000 |
| 11931860 |
Consumable part monitoring in chemical mechanical polisher |
Dominic J. Benvegnu |
2024-03-19 |
$54,086,000 |
| 11931853 |
Control of processing parameters for substrate polishing with angularly distributed zones using cost function |
Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Benjamin Cherian +1 more |
2024-03-19 |
$54,086,000 |
| 11780046 |
Polishing system with annular platen or polishing pad |
Paul D. Butterfield, Jeonghoon Oh, Shou-Sung Chang, Steven M. Zuniga, Fred C. Redeker |
2023-10-10 |
$39,034,000 |
| 11731238 |
Monitoring of polishing pad texture in chemical mechanical polishing |
Benjamin Cherian |
2023-08-22 |
$40,609,000 |
| 11701749 |
Monitoring of vibrations during chemical mechanical polishing |
Boguslaw A. Swedek, Dominic J. Benvegnu, Chih Chung Chou, Nicholas A. Wiswell, Jeonghoon Oh |
2023-07-18 |
$58,990,000 |
| 11699595 |
Imaging for monitoring thickness in a substrate cleaning system |
Dominic J. Benvegnu, Jun Qian, Boguslaw A. Swedek |
2023-07-11 |
$39,838,000 |
| 11651207 |
Training spectrum generation for machine learning system for spectrographic monitoring |
Benjamin Cherian, Nicholas A. Wiswell, Jun Qian |
2023-05-16 |
$64,199,000 |
| 11577356 |
Machine vision as input to a CMP process control algorithm |
Benjamin Cherian, Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek |
2023-02-14 |
$35,617,000 |
| 11571786 |
Consumable part monitoring in chemical mechanical polisher |
Dominic J. Benvegnu |
2023-02-07 |
$44,390,000 |
| 11511388 |
Polishing system with support post and annular platen or polishing pad |
Paul D. Butterfield, Jeonghoon Oh, Shou-Sung Chang, Steven M. Zuniga, Fred C. Redeker |
2022-11-29 |
$23,914,000 |
| 11507824 |
Training spectrum generation for machine learning system for spectrographic monitoring |
Benjamin Cherian, Nicholas A. Wiswell, Jun Qian |
2022-11-22 |
$48,755,000 |
| 11453097 |
Chemical mechanical polishing apparatus and methods |
Rajeev Bajaj, Hung Chih Chen, Terrance Y. Lee |
2022-09-27 |
$38,581,000 |
| 10589399 |
Textured small pad for chemical mechanical polishing |
Jeonghoon Oh, Edwin C. Suarez, Jason Garcheung Fung, Eric Lau, King Yi Heung +3 more |
2020-03-17 |
$17,260,000 |
| 10562147 |
Polishing system with annular platen or polishing pad for substrate monitoring |
Paul D. Butterfield, Jeonghoon Oh, Shou-Sung Chang, Steven M. Zuniga, Fred C. Redeker |
2020-02-18 |
$26,722,000 |
| 10500694 |
Chemical mechanical polishing apparatus and methods |
Rajeev Bajaj, Hung Chih Chen, Terrance Y. Lee |
2019-12-10 |
$14,920,000 |
| 10478937 |
Acoustic emission monitoring and endpoint for chemical mechanical polishing |
Jianshe Tang, David Masayuki Ishikawa, Benjamin Cherian, Jeonghoon Oh |
2019-11-19 |
$24,323,000 |
| 10256111 |
Chemical mechanical polishing automated recipe generation |
Eric Lau, King Yi Heung, Charles C. Garretson, Jun Qian, Shuchivrat Datar +1 more |
2019-04-09 |
$19,096,000 |
| 9242337 |
Dynamic residue clearing control with in-situ profile control (ISPC) |
Jun Qian, Sivakumar Dhandapani, Benjamin Cherian, Charles C. Garretson |
2016-01-26 |
$7,094,000 |
