Issued Patents All Time
Showing 25 most recent of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12420373 | Control of processing parameters during substrate polishing using cost function | Sivakumar Dhandapani | 2025-09-23 |
| 12403560 | Determining substrate precession with acoustic signals | Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld | 2025-09-02 |
| 12343840 | Control of processing parameters for substrate polishing with substrate precession | Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Brian J. Brown +1 more | 2025-07-01 |
| 12311494 | Pressure signals during motor torque monitoring to provide spatial resolution | Thomas Li | 2025-05-27 |
| 12257665 | Machine vision as input to a CMP process control algorithm | Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek, Thomas H. Osterheld | 2025-03-25 |
| 12148149 | Training a machine learning system to detect an excursion of a CMP component using time-based sequence of images | Sidney P. Huey, Thomas Li | 2024-11-19 |
| 12136574 | Technique for training neural network for use in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2024-11-05 |
| 12090599 | Determination of substrate layer thickness with polishing pad wear compensation | Kun Xu, Jun Qian, Kiran Shrestha | 2024-09-17 |
| 12079984 | Detecting an excursion of a CMP component using time-based sequence of images | Sidney P. Huey, Thomas Li | 2024-09-03 |
| 12057354 | Trained neural network in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2024-08-06 |
| 12020159 | Training spectrum generation for machine learning system for spectrographic monitoring | Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld | 2024-06-25 |
| 11969854 | Control of processing parameters during substrate polishing using expected future parameter changes | Sivakumar Dhandapani | 2024-04-30 |
| 11966212 | Spectrographic monitoring using a neural network | — | 2024-04-23 |
| 11931853 | Control of processing parameters for substrate polishing with angularly distributed zones using cost function | Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Brian J. Brown +1 more | 2024-03-19 |
| 11919121 | Control of processing parameters during substrate polishing using constrained cost function | Sivakumar Dhandapani | 2024-03-05 |
| 11865664 | Profile control with multiple instances of contol algorithm during polishing | Kun Xu, Harry Q. Lee, David Maxwell Gage | 2024-01-09 |
| 11865671 | Temperature-based in-situ edge assymetry correction during CMP | Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung Chou, Hui Chen +1 more | 2024-01-09 |
| 11850699 | Switching control algorithms on detection of exposure of underlying layer during polishing | Kun Xu, Harry Q. Lee, David Maxwell Gage | 2023-12-26 |
| 11791224 | Technique for training neural network for use in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2023-10-17 |
| 11780047 | Determination of substrate layer thickness with polishing pad wear compensation | Kun Xu, Jun Qian, Kiran Shrestha | 2023-10-10 |
| 11731238 | Monitoring of polishing pad texture in chemical mechanical polishing | Thomas H. Osterheld | 2023-08-22 |
| 11733686 | Machine learning systems for monitoring of semiconductor processing | Graham Yennie | 2023-08-22 |
| 11710228 | Detecting an excursion of a CMP component using time-based sequence of images and machine learning | Sidney P. Huey, Thomas Li | 2023-07-25 |
| 11697187 | Temperature-based assymetry correction during CMP and nozzle for media dispensing | Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung, Hui Chen +1 more | 2023-07-11 |
| 11658078 | Using a trained neural network for use in in-situ monitoring during polishing and polishing system | Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more | 2023-05-23 |