Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Benjamin Cherian — 49 Patents

Applied Materials: 49 patents #164 of 7,310Top 3%
San Jose, CA: #1,000 of 32,062 inventorsTop 4%
California: #8,285 of 386,348 inventorsTop 3%
Overall (All Time): #55,592 of 4,157,543Top 2%
49 Patents All Time
Benjamin Cherian has been granted 49 US patents while listed as an inventor at Applied Materials. The first was granted in 2015 and the most recent in December 2025. Benjamin Cherian ranks #55,592 of 4,157,543 US inventors in our database (top 1.3%). Patent records list Benjamin Cherian in San Jose, CA, US.

Issued Patents All Time

Showing 1–25 of 49 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12502748 Control substrate polishing using constrained cost function Sivakumar Dhandapani 2025-12-23
12504364 In-situ monitoring to label training spectra for machine learning system for spectrographic monitoring Thaddeus Siu-Por Li 2025-12-23
12479062 Determining substrate orientation with acoustic signals Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld 2025-11-25
12447577 Polishing apparatus using neural network for monitoring Kui Xu, Hassan G. Iravani, Denis Ivanov, Boguslaw A. Swedek, Shih-Haur Shen +1 more 2025-10-21
12440942 Pressure signals with different frequencies during friction monitoring to provide spatial resolution Thaddeus Siu-Por Li 2025-10-14
12420373 Control of processing parameters during substrate polishing using cost function Sivakumar Dhandapani 2025-09-23
12403560 Determining substrate precession with acoustic signals Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld 2025-09-02
12343840 Control of processing parameters for substrate polishing with substrate precession Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Brian J. Brown +1 more 2025-07-01
12311494 Pressure signals during motor torque monitoring to provide spatial resolution Thomas Li 2025-05-27
12257665 Machine vision as input to a CMP process control algorithm Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek, Thomas H. Osterheld 2025-03-25
12148149 Training a machine learning system to detect an excursion of a CMP component using time-based sequence of images Sidney P. Huey, Thomas Li 2024-11-19 $80,955,000
12136574 Technique for training neural network for use in in-situ monitoring during polishing and polishing system Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more 2024-11-05 $79,202,000
12090599 Determination of substrate layer thickness with polishing pad wear compensation Kun Xu, Jun Qian, Kiran Shrestha 2024-09-17 $46,375,000
12079984 Detecting an excursion of a CMP component using time-based sequence of images Sidney P. Huey, Thomas Li 2024-09-03 $44,731,000
12057354 Trained neural network in in-situ monitoring during polishing and polishing system Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more 2024-08-06 $90,312,000
12020159 Training spectrum generation for machine learning system for spectrographic monitoring Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld 2024-06-25 $57,214,000
11969854 Control of processing parameters during substrate polishing using expected future parameter changes Sivakumar Dhandapani 2024-04-30 $79,776,000
11966212 Spectrographic monitoring using a neural network 2024-04-23 $64,043,000
11931853 Control of processing parameters for substrate polishing with angularly distributed zones using cost function Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Brian J. Brown +1 more 2024-03-19 $54,086,000
11919121 Control of processing parameters during substrate polishing using constrained cost function Sivakumar Dhandapani 2024-03-05 $73,319,000
11865664 Profile control with multiple instances of contol algorithm during polishing Kun Xu, Harry Q. Lee, David Maxwell Gage 2024-01-09 $49,156,000
11865671 Temperature-based in-situ edge assymetry correction during CMP Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Chih Chung Chou, Hui Chen +1 more 2024-01-09 $49,156,000
11850699 Switching control algorithms on detection of exposure of underlying layer during polishing Kun Xu, Harry Q. Lee, David Maxwell Gage 2023-12-26 $30,871,000
11791224 Technique for training neural network for use in in-situ monitoring during polishing and polishing system Kun Xu, Kiran Shrestha, Doyle E. Bennett, David Maxwell Gage, Jun Qian +1 more 2023-10-17 $42,568,000
11780047 Determination of substrate layer thickness with polishing pad wear compensation Kun Xu, Jun Qian, Kiran Shrestha 2023-10-10 $39,034,000