Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12420373 | Control of processing parameters during substrate polishing using cost function | Benjamin Cherian | 2025-09-23 |
| 12384003 | Methods of modeling and controlling pad wear | — | 2025-08-12 |
| 12272047 | Residue measurement from machine learning based processing of substrate images | Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Shrestha | 2025-04-08 |
| 12169925 | System using film thickness estimation from machine learning based processing of substrate images | Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Shrestha | 2024-12-17 |
| 11989492 | Preston matrix generator | Thomas Li, Jun Qian | 2024-05-21 |
| 11969854 | Control of processing parameters during substrate polishing using expected future parameter changes | Benjamin Cherian | 2024-04-30 |
| 11969855 | Filtering during in-situ monitoring of polishing | — | 2024-04-30 |
| 11919121 | Control of processing parameters during substrate polishing using constrained cost function | Benjamin Cherian | 2024-03-05 |
| 11847776 | System using film thickness estimation from machine learning based processing of substrate images | Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Shrestha | 2023-12-19 |
| 11836913 | Film thickness estimation from machine learning based processing of substrate images | Arash Alahgholipouromrani, Dominic J. Benvegnu, Jun Qian, Kiran Shrestha | 2023-12-05 |
| 11679466 | Filtering during in-situ monitoring of polishing | — | 2023-06-20 |
| 11577362 | Pad conditioner cut rate monitoring | Sameer Deshpande, Jason Garcheung Fung | 2023-02-14 |
| 11504821 | Predictive filter for polishing pad wear rate monitoring | Jun Qian | 2022-11-22 |
| 11446783 | Filtering during in-situ monitoring of polishing | — | 2022-09-20 |
| 9607910 | Limiting adjustment of polishing rates during substrate polishing | Dominic J. Benvegnu, Benjamin Cherian, Harry Q. Lee | 2017-03-28 |
| 9490186 | Limiting adjustment of polishing rates during substrate polishing | Dominic J. Benvegnu, Benjamin Cherian, Harry Q. Lee | 2016-11-08 |
| 9375824 | Adjustment of polishing rates during substrate polishing with predictive filters | Dominic J. Benvegnu, Benjamin Cherian, Harry Q. Lee | 2016-06-28 |
| 9242337 | Dynamic residue clearing control with in-situ profile control (ISPC) | Jun Qian, Benjamin Cherian, Thomas H. Osterheld, Charles C. Garretson | 2016-01-26 |
| 9221147 | Endpointing with selective spectral monitoring | Jun Qian, Benjamin Cherian, Thomas H. Osterheld, Jeffrey Drue David, Gregory E. Menk +2 more | 2015-12-29 |
| 9138860 | Closed-loop control for improved polishing pad profiles | Jun Qian, Christopher Cocca, Jason Garcheung Fung, Shou-Sung Chang, Charles C. Garretson +2 more | 2015-09-22 |
| 8954186 | Selecting reference libraries for monitoring of multiple zones on a substrate | Jun Qian, Boguslaw A. Swedek, Harry Q. Lee, Jeffrey Drue David, Thomas H. Osterheld | 2015-02-10 |
| 8932107 | Gathering spectra from multiple optical heads | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu | 2015-01-13 |
| 8758085 | Method for compensation of variability in chemical mechanical polishing consumables | Asheesh Jain, Charles C. Garretson, Gregory E. Menk, Stan Tsai | 2014-06-24 |
| 8755927 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Jeffrey Drue David, Harry Q. Lee | 2014-06-17 |
| 8535115 | Gathering spectra from multiple optical heads | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu | 2013-09-17 |