Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651207 | Training spectrum generation for machine learning system for spectrographic monitoring | Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld | 2023-05-16 |
| 11577356 | Machine vision as input to a CMP process control algorithm | Jun Qian, Nicholas A. Wiswell, Dominic J. Benvegnu, Boguslaw A. Swedek, Thomas H. Osterheld | 2023-02-14 |
| 11507824 | Training spectrum generation for machine learning system for spectrographic monitoring | Nicholas A. Wiswell, Jun Qian, Thomas H. Osterheld | 2022-11-22 |
| 10994389 | Polishing apparatus using neural network for monitoring | Kun Xu, Hassan G. Iravani, Denis Ivanov, Boguslaw A. Swedek, Shih-Haur Shen +1 more | 2021-05-04 |
| 10969773 | Machine learning systems for monitoring of semiconductor processing | Graham Yennie | 2021-04-06 |
| 10795346 | Machine learning systems for monitoring of semiconductor processing | Graham Yennie | 2020-10-06 |
| 10732607 | Spectrographic monitoring using a neural network | — | 2020-08-04 |
| 10478937 | Acoustic emission monitoring and endpoint for chemical mechanical polishing | Jianshe Tang, David Masayuki Ishikawa, Jeonghoon Oh, Thomas H. Osterheld | 2019-11-19 |
| 10086492 | Applying dimensional reduction to spectral data from polishing substrates | Jeffrey Drue David, Boguslaw A. Swedek | 2018-10-02 |
| 9833874 | Applying dimensional reduction to spectral data from polishing substrates | Jeffrey Drue David, Boguslaw A. Swedek | 2017-12-05 |
| 9607910 | Limiting adjustment of polishing rates during substrate polishing | Dominic J. Benvegnu, Sivakumar Dhandapani, Harry Q. Lee | 2017-03-28 |
| 9551567 | Reducing noise in spectral data from polishing substrates | Jeffrey Drue David, Boguslaw A. Swedek | 2017-01-24 |
| 9490186 | Limiting adjustment of polishing rates during substrate polishing | Dominic J. Benvegnu, Sivakumar Dhandapani, Harry Q. Lee | 2016-11-08 |
| 9375824 | Adjustment of polishing rates during substrate polishing with predictive filters | Dominic J. Benvegnu, Sivakumar Dhandapani, Harry Q. Lee | 2016-06-28 |
| 9242337 | Dynamic residue clearing control with in-situ profile control (ISPC) | Jun Qian, Sivakumar Dhandapani, Thomas H. Osterheld, Charles C. Garretson | 2016-01-26 |
| 9227293 | Multi-platen multi-head polishing architecture | Jeffrey Drue David, Boguslaw A. Swedek, Doyle E. Bennett, Thomas H. Osterheld, Dominic J. Benvegnu +3 more | 2016-01-05 |
| 9221147 | Endpointing with selective spectral monitoring | Jun Qian, Sivakumar Dhandapani, Thomas H. Osterheld, Jeffrey Drue David, Gregory E. Menk +2 more | 2015-12-29 |
| 9056383 | Path for probe of spectrographic metrology system | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Thomas H. Osterheld, Jun Qian +4 more | 2015-06-16 |
| 8992286 | Weighted regression of thickness maps from spectral data | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Jun Qian, Thomas H. Osterheld | 2015-03-31 |