Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12343840 | Control of processing parameters for substrate polishing with substrate precession | Eric Lau, Charles C. Garretson, Zhize Zhu, Benjamin Cherian, Brian J. Brown +1 more | 2025-07-01 |
| 11931853 | Control of processing parameters for substrate polishing with angularly distributed zones using cost function | Eric Lau, Charles C. Garretson, Zhize Zhu, Benjamin Cherian, Brian J. Brown +1 more | 2024-03-19 |
| 11869815 | Asymmetry correction via oriented wafer loading | Eric Lau, Charles C. Garretson, Zhize Zhu | 2024-01-09 |
| 11673226 | Retaining ring for CMP | Andrew J. Nagengast, Christopher Heung-Gyun Lee, Thomas Li, Anand N. Iyer, Jie Diao +3 more | 2023-06-13 |
| 11400560 | Retaining ring design | Jeonghoon Oh, Charles C. Garretson, Eric Lau, Andrew J. Nagengast, Steven M. Zuniga +2 more | 2022-08-02 |
| 11282755 | Asymmetry correction via oriented wafer loading | Eric Lau, Charles C. Garretson, Zhize Zhu | 2022-03-22 |
| 11241769 | Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes | David Masayuki Ishikawa, Jeonghoon Oh, Garrett H. Sin, Charles C. Garretson, Chia-Ling PAI +2 more | 2022-02-08 |
| 11173579 | Inner retaining ring and outer retaining ring for carrier head | Hung Chih Chen, Mario David Silvetti, Yin Yuan, Samuel Chu-Chiang Hsu, Gautam Shashank Dandavate | 2021-11-16 |
| 10493590 | Selection of polishing parameters to generate removal or pressure profile | Garrett H. Sin, King Yi Heung, Nathan Bohannon, Qing Zhang | 2019-12-03 |
| 10322492 | Retaining ring for CMP | Andrew J. Nagengast, Christopher Heung-Gyun Lee, Thomas Li, Anand N. Iyer, Jie Diao +3 more | 2019-06-18 |
| 10252397 | Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes | David Masayuki Ishikawa, Jeonghoon Oh, Garrett H. Sin, Charles C. Garretson, Chia-Ling PAI +2 more | 2019-04-09 |
| 10022837 | Inner retaining ring and outer retaining ring for carrier head | Hung Chih Chen, Yin Yuan, Samuel Chu-Chiang Hsu, Gautam Shashank Dandavate | 2018-07-17 |
| 9213340 | Selection of polishing parameters to generate removal or pressure profile | Garrett H. Sin, King Yi Heung, Nathan Bohannon, Qing Zhang | 2015-12-15 |
| 8840446 | Inner retaining ring and outer retaining ring for carrier head | Hung Chih Chen, Samuel Chu-Chiang Hsu, Yin Yuan, Gautam Shashank Dandavate | 2014-09-23 |
| 8774958 | Selection of polishing parameters to generate removal profile | Garrett H. Sin, King Yi Heung, Nathan Bohannon, Qing Zhang | 2014-07-08 |
| 8721391 | Carrier head with narrow inner ring and wide outer ring | Hung Chih Chen, Samuel Chu-Chiang Hsu, Yin Yuan, Gautam Shashank Dandavate | 2014-05-13 |
| 6811470 | Methods and compositions for chemical mechanical polishing shallow trench isolation substrates | Benjamin A. Bonner, Anand N. Iyer, Deepak Kumar, Thomas H. Osterheld, Wei-Yung Hsu +2 more | 2004-11-02 |