| 10610994 |
Polishing system with local area rate control and oscillation mode |
Eric Lau, Hui Chen, Chih Chung Chou, Edwin C. Suarez, Garrett H. Sin +2 more |
2020-04-07 |
| 10589399 |
Textured small pad for chemical mechanical polishing |
Jeonghoon Oh, Edwin C. Suarez, Jason Garcheung Fung, Eric Lau, Ashwin CHOCKALINGAM +3 more |
2020-03-17 |
| 10493590 |
Selection of polishing parameters to generate removal or pressure profile |
Huanbo Zhang, Garrett H. Sin, Nathan Bohannon, Qing Zhang |
2019-12-03 |
| 10434623 |
Local area polishing system and polishing pad assemblies for a polishing system |
Eric Lau, Hui Chen, Wei-Cheng Lee, Chih Chung Chou, Edwin C. Suarez +3 more |
2019-10-08 |
| 10256111 |
Chemical mechanical polishing automated recipe generation |
Eric Lau, Charles C. Garretson, Jun Qian, Thomas H. Osterheld, Shuchivrat Datar +1 more |
2019-04-09 |
| 9213340 |
Selection of polishing parameters to generate removal or pressure profile |
Huanbo Zhang, Garrett H. Sin, Nathan Bohannon, Qing Zhang |
2015-12-15 |
| 8774958 |
Selection of polishing parameters to generate removal profile |
Huanbo Zhang, Garrett H. Sin, Nathan Bohannon, Qing Zhang |
2014-07-08 |
