Issued Patents All Time
Showing 25 most recent of 150 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400881 | Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning | Wei Lu, Jimin Zhang, Jianshe Tang | 2025-08-26 |
| 12343840 | Control of processing parameters for substrate polishing with substrate precession | Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Benjamin Cherian +1 more | 2025-07-01 |
| 12296427 | Apparatus and method for CMP temperature control | Haosheng Wu, Shou-Sung Chang, Chih Chung Chou, Jianshe Tang, Hui Chen +1 more | 2025-05-13 |
| 12285838 | Wafer edge asymmetry correction using groove in polishing pad | Jimin Zhang, Jianshe Tang, Wei Lu, Priscilla Diep LaRosa | 2025-04-29 |
| 12224186 | Apparatus and method of brush cleaning using periodic chemical treatments | — | 2025-02-11 |
| 12198944 | Substrate handling in a modular polishing system with single substrate cleaning chambers | Ekaterina A. Mikhaylichenko, Jin Ji, Jagan Rangarajan, Steven M. Zuniga | 2025-01-14 |
| 12194591 | Roller for location-specific wafer polishing | Ekaterina A. Mikhaylichenko, Fred C. Redeker, Chirantha Rodrigo, Steven M. Zuniga, Jay Gurusamy | 2025-01-14 |
| 12051599 | Cleaning method with in-line SPM processing | Ekaterina A. Mikhaylichenko, Brian K. Kirkpatrick | 2024-07-30 |
| 12030156 | Polishing carrier head with piezoelectric pressure control | Andrew J. Nagengast, Justin Ho Kuen Wong | 2024-07-09 |
| 12027382 | Surface cleaning with directed high pressure chemistry | Brian K. Kirkpatrick, Ekaterina A. Mikhaylichenko | 2024-07-02 |
| 11951589 | Wafer edge asymmetry correction using groove in polishing pad | Jimin Zhang, Jianshe Tang, Wei Lu, Priscilla Diep | 2024-04-09 |
| 11931854 | Chemical mechanical polishing using time share control | Jimin Zhang, Jianshe Tang, Wei Lu, Priscilla Diep LaRosa | 2024-03-19 |
| 11931853 | Control of processing parameters for substrate polishing with angularly distributed zones using cost function | Eric Lau, Charles C. Garretson, Huanbo Zhang, Zhize Zhu, Benjamin Cherian +1 more | 2024-03-19 |
| 11897079 | Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity | Haosheng Wu, Hari Soundararajan, Jianshe Tang, Shou-Sung Chang, Yen-Chu Yang +2 more | 2024-02-13 |
| 11890715 | Polishing carrier head with piezoelectric pressure control | Andrew J. Nagengast, Justin Ho Kuen Wong | 2024-02-06 |
| 11826872 | Temperature and slurry flow rate control in CMP | Haosheng Wu, Jianshe Tang, Shih-Haur Shen, Shou-Sung Chang, Hari Soundararajan | 2023-11-28 |
| 11823916 | Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning | Wei Lu, Jimin Zhang, Jianshe Tang | 2023-11-21 |
| 11764069 | Asymmetry correction via variable relative velocity of a wafer | Jimin Zhang, Eric Lau, Ekaterina A. Mikhaylichenko, Jeonghoon Oh, Gerald Alonzo | 2023-09-19 |
| 11682567 | Cleaning system with in-line SPM processing | Ekaterina A. Mikhaylichenko, Brian K. Kirkpatrick | 2023-06-20 |
| 11400560 | Retaining ring design | Jeonghoon Oh, Charles C. Garretson, Eric Lau, Andrew J. Nagengast, Steven M. Zuniga +2 more | 2022-08-02 |
| 11298794 | Chemical mechanical polishing using time share control | Jimin Zhang, Jianshe Tang, Wei Lu, Priscilla Diep | 2022-04-12 |
| 11267095 | High throughput polishing system for workpieces | Stephen M Fisher, II, Robindranath Banerjee, Christopher Laurent Beaudry | 2022-03-08 |
| 10932323 | Reflector and susceptor assembly for chemical vapor deposition reactor | Brian H. Burrows, Abril Cabreros, David Masayuki Ishikawa, Alexander Lerner | 2021-02-23 |
| 10672628 | Single use rinse in a linear Marangoni drier | — | 2020-06-02 |
| 10259206 | Epitaxial lift off systems and methods | Brian H. Burrows, David Berkstressor, Gang He, Thomas J. Gmitter | 2019-04-16 |