Issued Patents All Time
Showing 25 most recent of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12051599 | Cleaning method with in-line SPM processing | Brian J. Brown, Ekaterina A. Mikhaylichenko | 2024-07-30 |
| 12027382 | Surface cleaning with directed high pressure chemistry | Ekaterina A. Mikhaylichenko, Brian J. Brown | 2024-07-02 |
| 11942359 | Reduced semiconductor wafer bow and warpage | Abbas Ali, Christopher Scott Whitesell, Byron Joseph Palla | 2024-03-26 |
| 11682567 | Cleaning system with in-line SPM processing | Brian J. Brown, Ekaterina A. Mikhaylichenko | 2023-06-20 |
| 11239346 | Split gate memory cell fabrication and system | John Howard MacPeak, Douglas Ticknor Grider | 2022-02-01 |
| 11205578 | Dopant anneal with stabilization step for IC with matched devices | Kenneth Palomino, Mahalingam Nandakumar | 2021-12-21 |
| 11205575 | Method for stripping one or more layers from a semiconductor wafer | Byron Joseph Palla, Stephen A. Keller, Brian Edward Hornung, Douglas Ticknor Grider | 2021-12-21 |
| 10483261 | Integrated circuit having chemically modified spacer surface | Amitabh Jain | 2019-11-19 |
| 9881795 | Method of fabricating semiconductors | David Gerald Farber, Ping Jiang, Douglas Ticknor Grider | 2018-01-30 |
| 9768078 | Inner L-spacer for replacement gate flow | Chet V. Lenox, Seung-Chul Song | 2017-09-19 |
| 9721847 | High-k / metal gate CMOS transistors with TiN gates | Hiroaki Niimi | 2017-08-01 |
| 9620423 | Integrated circuit having chemically modified spacer surface | Amitabh Jain | 2017-04-11 |
| 9496359 | Integrated circuit having chemically modified spacer surface | Amitabh Jain | 2016-11-15 |
| 9490143 | Method of fabricating semiconductors | David Gerald Farber, Ping Jiang, Douglas Ticknor Grider | 2016-11-08 |
| 9362375 | Inner L-spacer for replacement gate flow | Chet V. Lenox, Seung-Chul Song | 2016-06-07 |
| 9224657 | Hard mask for source/drain epitaxy control | David Gerald Farber, Tom Lii | 2015-12-29 |
| 9178037 | Inner L-spacer for replacement gate flow | Chet V. Lenox, Seung-Chul Song | 2015-11-03 |
| 9087917 | Inner L-spacer for replacement gate flow | Chet V. Lenox, Seung-Chul Song | 2015-07-21 |
| 9070785 | High-k / metal gate CMOS transistors with TiN gates | Hiroaki Niimi | 2015-06-30 |
| 8748996 | Semiconductor device including SiON gate dielectric with portions having different nitrogen concentrations | James Joseph Chambers, Hiroaki Niimi | 2014-06-10 |
| 8748992 | MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls | James Joseph Chambers | 2014-06-10 |
| 8618661 | Die having coefficient of thermal expansion graded layer | Rajesh Tiwari | 2013-12-31 |
| 8450221 | Method of forming MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls | James Joseph Chambers | 2013-05-28 |
| 8441078 | Semiconductor device including SiON gate dielectric with portions having different nitrogen concentrations | James Joseph Chambers, Hiroaki Niimi | 2013-05-14 |
| 8372703 | Gate dielectric first replacement gate processes and integrated circuits therefrom | Freidoon Mehrad, Shaofeng Yu | 2013-02-12 |