SS

Seung-Chul Song

TI Texas Instruments: 11 patents #1,283 of 12,488Top 15%
QU Qualcomm: 7 patents #2,597 of 12,104Top 25%
LG: 2 patents #13,302 of 26,165Top 55%
SE Sematech: 1 patents #38 of 123Top 35%
IBM: 1 patents #44,794 of 70,183Top 65%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Plano, TX: #265 of 4,842 inventorsTop 6%
🗺 Texas: #5,702 of 125,132 inventorsTop 5%
Overall (All Time): #183,878 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Showing 1–23 of 23 patents

Patent #TitleCo-InventorsDate
10879133 Replacement metal gate process for CMOS integrated circuits Hiroaki Niimi 2020-12-29
9875788 Low-power 5T SRAM with improved stability and reduced bitcell size Seong-Ook Jung, Hyunkook Park, Mohamed H. Abu-Rahma, Lixin Ge, Zhongze Wang +1 more 2018-01-23
9865330 Stable SRAM bitcell design utilizing independent gate FinFET Seong-Ook Jung, Mingu Kang, Hyunkook Park, Mohamed H. Abu-Rahma, Beom-Mo Han +2 more 2018-01-09
9768078 Inner L-spacer for replacement gate flow Chet V. Lenox, Brian K. Kirkpatrick 2017-09-19
9659825 Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved epi profile Deborah J. Riley 2017-05-23
9362375 Inner L-spacer for replacement gate flow Chet V. Lenox, Brian K. Kirkpatrick 2016-06-07
9337100 Apparatus and method to fabricate an electronic device Beom-Mo Han, Mohamed H. Abu-Rahma 2016-05-10
9224656 Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved gate spacer control Deborah J. Riley 2015-12-29
9178037 Inner L-spacer for replacement gate flow Chet V. Lenox, Brian K. Kirkpatrick 2015-11-03
9178038 Raised source/drain MOS transistor and method of forming the transistor with an implant spacer and an epitaxial spacer James Walter Blatchford, Kwan-Yong Lim 2015-11-03
9093555 Method of CMOS manufacturing utilizing multi-layer epitaxial hardmask films for improved EPI profile Deborah J. Riley 2015-07-28
9087917 Inner L-spacer for replacement gate flow Chet V. Lenox, Brian K. Kirkpatrick 2015-07-21
8803253 Replacement metal gate process for CMOS integrated circuits Hiroaki Niimi 2014-08-12
8796777 Fin-type device system and method Mohamed H. Abu-Rahma, Beom-Mo Han 2014-08-05
8691644 Method of forming a CMOS device with a stressed-channel NMOS transistor and a strained-channel PMOS transistor Amitabh Jain, Deborah J. Riley 2014-04-08
8447547 Static noise margin estimation Seong-Ook Jung, Hyunkook Park 2013-05-21
8236686 Dual metal gates using one metal to alter work function of another metal Byoung Hun Lee, Sang Ho Bae, Kisik Choi, Rino Choi, Craig Huffman +3 more 2012-08-07
8130534 System and method to read and write data a magnetic tunnel junction element Mohamed H. Abu-Rahma, Sei Seung Yoon, Dongkyu Park, Cheng Zhong, Anosh B. Davierwalla 2012-03-06
7829951 Method of fabricating a fin field effect transistor (FinFET) device Mohamed H. Abu-Rahma, Beom-Mo Han 2010-11-09
7741168 Systems and methods for fabricating nanometric-scale semiconductor devices with dual-stress layers using double-stress oxide/nitride stacks Joel Barnett, Byong-Sun Ju 2010-06-22
7026662 Semiconductor device having a photon absorption layer to prevent plasma damage 2006-04-11
6542201 Zooming apparatus and method in digital TV Jin Ho Ahn 2003-04-01
6501508 Video format converter for digital receiving system Dong Il Han, Jin Ho Ahn 2002-12-31