Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10134731 | Dielectric liner added after contact etch before silicide formation | — | 2018-11-20 |
| 9741624 | Spacer shaper formation with conformal dielectric film for void free PMD gap fill | — | 2017-08-22 |
| 9704720 | Uniform, damage free nitride ETCH | David Gerald Farber | 2017-07-11 |
| 9659935 | Dielectric liner added after contact etch before silicide formation | — | 2017-05-23 |
| 9437449 | Uniform, damage free nitride etch | David Gerald Farber | 2016-09-06 |
| 9406779 | Spacer shaper formation with conformal dielectric film for void free PMD gap fill | — | 2016-08-02 |
| 9385044 | Replacement gate process | — | 2016-07-05 |
| 9224657 | Hard mask for source/drain epitaxy control | David Gerald Farber, Brian K. Kirkpatrick | 2015-12-29 |
| 9093303 | Spacer shaper formation with conformal dielectric film for void free PMD gap fill | — | 2015-07-28 |
| 9093380 | Dielectric liner added after contact etch before silicide formation | — | 2015-07-28 |
| 9054158 | Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined opening | David Gerald Farber, Steve Lytle | 2015-06-09 |
| 8507386 | Lateral uniformity in silicon recess etch | David Gerald Farber | 2013-08-13 |