| 10134731 |
Dielectric liner added after contact etch before silicide formation |
— |
2018-11-20 |
| 9741624 |
Spacer shaper formation with conformal dielectric film for void free PMD gap fill |
— |
2017-08-22 |
| 9704720 |
Uniform, damage free nitride ETCH |
David Gerald Farber |
2017-07-11 |
| 9659935 |
Dielectric liner added after contact etch before silicide formation |
— |
2017-05-23 |
| 9437449 |
Uniform, damage free nitride etch |
David Gerald Farber |
2016-09-06 |
| 9406779 |
Spacer shaper formation with conformal dielectric film for void free PMD gap fill |
— |
2016-08-02 |
| 9385044 |
Replacement gate process |
— |
2016-07-05 |
| 9224657 |
Hard mask for source/drain epitaxy control |
David Gerald Farber, Brian K. Kirkpatrick |
2015-12-29 |
| 9093303 |
Spacer shaper formation with conformal dielectric film for void free PMD gap fill |
— |
2015-07-28 |
| 9093380 |
Dielectric liner added after contact etch before silicide formation |
— |
2015-07-28 |
| 9054158 |
Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined opening |
David Gerald Farber, Steve Lytle |
2015-06-09 |
| 8507386 |
Lateral uniformity in silicon recess etch |
David Gerald Farber |
2013-08-13 |