Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12011801 | Printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2024-06-18 |
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11673225 | Printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2023-06-13 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11453097 | Chemical mechanical polishing apparatus and methods | Rajeev Bajaj, Thomas H. Osterheld, Hung Chih Chen | 2022-09-27 |
| 11207758 | Printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2021-12-28 |
| 10843306 | Printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2020-11-24 |
| 10793954 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2020-10-06 |
| 10527407 | In-situ metrology method for thickness measurement during PECVD processes | Khokan Chandra Paul, Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee +1 more | 2020-01-07 |
| 10500694 | Chemical mechanical polishing apparatus and methods | Rajeev Bajaj, Thomas H. Osterheld, Hung Chih Chen | 2019-12-10 |
| 10354875 | Techniques for improved removal of sacrificial mask | Rajesh Prasad, Ning Zhan, Tzu-Yu Liu, James Cournoyer, Kyu-Ha Shim +4 more | 2019-07-16 |
| 10281261 | In-situ metrology method for thickness measurement during PECVD processes | Khokan Chandra Paul, Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee +1 more | 2019-05-07 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 10029405 | Printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2018-07-24 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |
| 9744724 | Apparatus for printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2017-08-29 |
| 9457520 | Apparatus for printing a chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2016-10-04 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 9067299 | Printed chemical mechanical polishing pad | Rajeev Bajaj, Barry Chin | 2015-06-30 |
| 5292399 | Plasma etching apparatus with conductive means for inhibiting arcing | Fred C. Redeker, Petru N. Nitescu, Robert Steger, David W. Groechel, Semyon Sherstinsky +2 more | 1994-03-08 |