SC

Shou-Sung Chang

Applied Materials: 57 patents #130 of 7,310Top 2%
AP Aplex: 5 patents #2 of 32Top 7%
MV Mosel Vitelic: 2 patents #107 of 482Top 25%
📍 Mountain View, CA: #142 of 11,022 inventorsTop 2%
🗺 California: #5,163 of 386,348 inventorsTop 2%
Overall (All Time): #34,205 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 51–64 of 64 patents

Patent #TitleCo-InventorsDate
7597608 Pad conditioning device with flexible media mount Steven M. Zuniga 2009-10-06
7344431 Pad assembly for electrochemical mechanical processing Yongqi Hu, Stan Tsai, Yan Wang, Feng Q. Liu, Liang-Yuh Chen 2008-03-18
7285036 Pad assembly for electrochemical mechanical polishing Stan Tsai, Donald Olgado, Liang-Yuh Chen, Alain Duboust, Ralph Wadensweiler 2007-10-23
7137868 Pad assembly for electrochemical mechanical processing Stan Tsai, Donald Olgado, Liang-Yuh Chen, Alain Duboust, Ralph Wadensweiler 2006-11-21
7077721 Pad assembly for electrochemical mechanical processing Yongqi Hu, Stan Tsai, Yan Wang, Feng Q. Liu, Liang-Yuh Chen 2006-07-18
7029365 Pad assembly for electrochemical mechanical processing Stan Tsai, Donald Olgado, Liang-Yuh Chen, Alain Duboust, Ralph Wadensweiler 2006-04-18
6776693 Method and apparatus for face-up substrate polishing Alain Duboust, Liang-Yuh Chen, Yan Wang, Siew Neo, Lizhong Sun +1 more 2004-08-17
6322429 Conditioner assembly and a conditioner back support for a chemical mechanical polishing apparatus Ethan C. Wilson, James A. Allen, David E. Weldon, Gregory C. Lee, Linh X. Can +2 more 2001-11-27
6315857 Polishing pad shaping and patterning Tsungnan Cheng, Ethan C. Wilson, Gregory C. Lee, Huey-Ming Tzeng, David E. Weldon +3 more 2001-11-13
6159083 Polishing head for a chemical mechanical polishing apparatus Gregory A. Appel, Charles J. Regan, David E. Weldon, Gregory C. Lee 2000-12-12
6080040 Wafer carrier head with inflatable bladder and attack angle control for polishing Gregory A. Appel, Ethan C. Wilson 2000-06-27
6042457 Conditioner assembly for a chemical mechanical polishing apparatus Ethan C. Wilson, James A. Allen, David E. Weldon, Gregory C. Lee, Linh X. Can +2 more 2000-03-28
6000997 Temperature regulation in a CMP process Shu-Hsin Kao, Huey-Ming Tzeng, Gregory C. Lee, Greg Simon, Harry W. Lee, Jr. +5 more 1999-12-14
5980368 Polishing tool having a sealed fluid chamber for support of polishing pad Shu-Hsin Kao, David E. Weldon 1999-11-09