| 11919123 |
Apparatus and method for CMP temperature control |
Hari Soundararajan, Hui Chen, Shou-Sung Chang |
2024-03-05 |
$73,319,000 |
| 11769684 |
Wafer heater with backside and integrated bevel purge |
Tejas Ulavi, Vijay D. Parkhe, Naveen Kumar Nagaraja, Sanjeev Baluja, Dhritiman Subha Kashyap +1 more |
2023-09-26 |
$66,272,000 |
| 11577358 |
Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing |
Hui Chen, Chih Chung Chou, Shou-Sung Chang |
2023-02-14 |
$35,617,000 |
| 11209398 |
High quality factor embedded resonator wafers |
Chuang-Chia Lin, Upendra Ummethala |
2021-12-28 |
$93,125,000 |
| 11021790 |
Liner for processing chamber |
Zhepeng CONG, Schubert S. Chu, Nyi O. Myo, Kartik Shah |
2021-06-01 |
$74,932,000 |
| 10386126 |
Apparatus for controlling temperature uniformity of a substrate |
Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli +1 more |
2019-08-20 |
$26,004,000 |
| 10132003 |
Heating modulators to improve epi uniformity tuning |
Shu-Kwan LAU, Joseph M. Ranish, Zhiyuan Ye, Kartik Shah, Mehmet Tugrul Samir +1 more |
2018-11-20 |
$33,309,000 |
| 10119192 |
EPI base ring |
Steve Aboagye, Paul Brillhart, Anzhong Chang, Satheesh Kuppurao, Mehmet Tugrul Samir +1 more |
2018-11-06 |
$24,517,000 |
| 9768043 |
Quartz upper and lower domes |
Anzhong Chang, Paul Brillhart, Satheesh Kuppurao, Mehmet Tugrul Samir, David K. Carlson +9 more |
2017-09-19 |
$15,798,000 |
| 9322097 |
EPI base ring |
Steve Aboagye, Paul Brillhart, Anzhong Chang, Satheesh Kuppurao, Mehmet Tugrul Samir +1 more |
2016-04-26 |
$17,040,000 |
| 9267742 |
Apparatus for controlling the temperature uniformity of a substrate |
Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli +1 more |
2016-02-23 |
$9,765,000 |
| 9248509 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity |
Hamid Tavassoli, Kallol Bera, Xiaoping Zhou, Shane C. Nevil, Douglas A. Buchberger, Jr. |
2016-02-02 |
$8,701,000 |
| 8822876 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity |
Hamid Tavassoli, Kallol Bera, Xiaoping Zhou, Shane C. Nevil, Douglas A. Buchberger, Jr. |
2014-09-02 |
$23,819,000 |
| 8629370 |
Assembly for delivering RF power and DC voltage to a plasma processing chamber |
Hamid Tavassoli, Shane C. Nevil, Douglas A. Buchberger, Jr. |
2014-01-14 |
$25,031,000 |
