Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11813712 | Polishing pads having selectively arranged porosity | Aniruddh Jagdish Khanna, Jason Garcheung Fung, Puneet Narendra JAWALI, Rajeev Bajaj, Nandan BARADANAHALLI KENCHAPPA +4 more | 2023-11-14 |
| 11806829 | Advanced polishing pads and related polishing pad manufacturing methods | Puneet Narendra JAWALI, Nandan BARADANAHALLI KENCHAPPA, Jason Garcheung Fung, Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE, Rajeev Bajaj +1 more | 2023-11-07 |
| 8556684 | Retaining ring for chemical mechanical polishing | William B. Sather | 2013-10-15 |
| 8517803 | Retaining ring for chemical mechanical polishing | William B. Sather | 2013-08-27 |
| 8298046 | Retaining rings | George J. Frank, William B. Sather | 2012-10-30 |
| 6561891 | Eliminating air pockets under a polished pad | Stanley E. Eppert, Jr., Peter W. Freeman, Elizabeth A. (Kegerise) Langlois | 2003-05-13 |
| 5910043 | Polishing pad for chemical-mechanical planarization of a semiconductor wafer | Salman Akram | 1999-06-08 |
| 5899745 | Method of chemical mechanical polishing (CMP) using an underpad with different compression regions and polishing pad therefor | Sung-Cheol Kim, Lei Ping Lai, Rajeev Bajaj | 1999-05-04 |
| 5738567 | Polishing pad for chemical-mechanical planarization of a semiconductor wafer | Salman Akram | 1998-04-14 |