Issued Patents All Time
Showing 51–75 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10399201 | Advanced polishing pads having compositional gradients by use of an additive manufacturing process | Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more | 2019-09-03 |
| 10399205 | Systems, apparatus, and methods for chemical polishing | Balasubramaniam Coimbatore Jaganathan | 2019-09-03 |
| 10391605 | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process | Sivapackia Ganapathiappan, Boyi Fu, Ashwin CHOCKALINGAM, Daniel Redfield, Mahendra C. ORILALL +3 more | 2019-08-27 |
| 10384330 | Polishing pads produced by an additive manufacturing process | Daniel Redfield, Mahendra C. ORILALL, Boyi Fu, Aniruddh Jagdish Khanna, Jason Garcheung Fung +12 more | 2019-08-20 |
| 10322491 | Printed chemical mechanical polishing pad | Mahendra C. ORILALL, Timothy Michaelson, Kasiraman Krishnan, Nag B. Patibandla, Daniel Redfield +2 more | 2019-06-18 |
| 10226853 | Methods and apparatus for conditioning of chemical mechanical polishing pads | Hung Chih Chen | 2019-03-12 |
| 10086500 | Method of manufacturing a UV curable CMP polishing pad | Mahendra C. ORILALL, Fred C. Redeker | 2018-10-02 |
| 10029405 | Printing a chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2018-07-24 |
| 9873180 | CMP pad construction with composite material properties using additive manufacturing processes | Kasiraman Krishnan, Mahendra C. ORILALL, Daniel Redfield, Fred C. Redeker, Nag B. Patibandla +4 more | 2018-01-23 |
| 9776361 | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles | Kasiraman Krishnan, Daniel Redfield, Russell Edward Perry, Gregory E. Menk, Fred C. Redeker +3 more | 2017-10-03 |
| 9744724 | Apparatus for printing a chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2017-08-29 |
| 9669512 | CMP pads having material composition that facilitates controlled conditioning | Craig E. Bohn, Fred C. Redeker | 2017-06-06 |
| 9597770 | Method of fabricating a polishing | William C. Allison, Diane Scott | 2017-03-21 |
| 9486893 | Conditioning of grooving in polishing pads | Hung Chih Chen, Brian J. Brown, Robert Lum, Fred C. Redeker | 2016-11-08 |
| 9457520 | Apparatus for printing a chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2016-10-04 |
| 9296085 | Polishing pad with homogeneous body having discrete protrusions thereon | Ping Huang, Robert Kerprich, William C. Allison, Richard L. Frentzel, Diane Scott | 2016-03-29 |
| 9162344 | Method and apparatus for CMP conditioning | — | 2015-10-20 |
| 9067299 | Printed chemical mechanical polishing pad | Barry Chin, Terrance Y. Lee | 2015-06-30 |
| 8920219 | Polishing pad with alignment aperture | William C. Allison, Diane Scott | 2014-12-30 |
| 8398463 | Pad conditioner and method | — | 2013-03-19 |
| 8292692 | Polishing pad with endpoint window and systems and method using the same | — | 2012-10-23 |
| 8177603 | Polishing pad composition | — | 2012-05-15 |
| 8075745 | Electro-method and apparatus for improved chemical mechanical planarization pad with uniform polish performance | — | 2011-12-13 |
| 8066555 | Polishing pad | — | 2011-11-29 |
| 7846008 | Method and apparatus for improved chemical mechanical planarization and CMP pad | — | 2010-12-07 |