Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10946495 | Low density polishing pad | Ping Huang, Richard L. Frentzel, Paul Andre Lefevre, Robert Kerprich, Diane Scott | 2021-03-16 |
| 10293459 | Polishing pad having polishing surface with continuous protrusions | Paul Andre Lefevre, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more | 2019-05-21 |
| 10160092 | Polishing pad having polishing surface with continuous protrusions having tapered sidewalls | Paul Andre Lefevre, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more | 2018-12-25 |
| 9931728 | Polishing pad with foundation layer and polishing surface layer | Diane Scott, Paul Andre Lefevre, James P. LaCasse, Alexander William Simpson | 2018-04-03 |
| 9931729 | Polishing pad with grooved foundation layer and polishing surface layer | Paul Andre Lefevre, Diane Scott, James P. LaCasse | 2018-04-03 |
| 9868185 | Polishing pad with foundation layer and window attached thereto | Paul Andre Lefevre, Diane Scott, Jose I. Arno | 2018-01-16 |
| 9649742 | Polishing pad having polishing surface with continuous protrusions | Paul Andre Lefevre, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more | 2017-05-16 |
| 9597770 | Method of fabricating a polishing | Diane Scott, Rajeev Bajaj | 2017-03-21 |
| 9597769 | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer | Paul Andre Lefevre, James P. LaCasse, Diane Scott, Alexander William Simpson, Ping Huang +1 more | 2017-03-21 |
| 9597777 | Homogeneous polishing pad for eddy current end-point detection | Diane Scott, Ping Huang, Richard L. Frentzel, Alexander William Simpson | 2017-03-21 |
| 9555518 | Polishing pad with multi-modal distribution of pore diameters | Ping Huang, Diane Scott, James P. LaCasse | 2017-01-31 |
| 9333577 | Electro discharge machining apparatus and method | Peng Li, Bin Wei, Huiya Xu, Mark Joseph Gleason, Jeffrey F. Wessels +1 more | 2016-05-10 |
| 9296085 | Polishing pad with homogeneous body having discrete protrusions thereon | Rajeev Bajaj, Ping Huang, Robert Kerprich, Richard L. Frentzel, Diane Scott | 2016-03-29 |
| 9249273 | Polishing pad with alignment feature | Robert Kerprich, Diane Scott | 2016-02-02 |
| 9238294 | Polishing pad having porogens with liquid filler | Paul Andre Lefevre | 2016-01-19 |
| 9211628 | Polishing pad with concentric or approximately concentric polygon groove pattern | Diane Scott, Alexander William Simpson | 2015-12-15 |
| 9156124 | Soft polishing pad for polishing a semiconductor substrate | Diane Scott, Robert Kerprich, Ping Huang, Richard L. Frentzel | 2015-10-13 |
| 9067297 | Polishing pad with foundation layer and polishing surface layer | Diane Scott, Paul Andre Lefevre, James P. LaCasse, Alexander William Simpson | 2015-06-30 |
| 9067298 | Polishing pad with grooved foundation layer and polishing surface layer | Paul Andre Lefevre, Diane Scott, James P. LaCasse | 2015-06-30 |
| 9028302 | Polishing pad for eddy current end-point detection | Diane Scott, Ping Huang, Richard L. Frentzel, Alexander William Simpson | 2015-05-12 |
| 9017140 | CMP pad with local area transparency | Ping Huang, Diane Scott, Richard L. Frentzel, Robert Kerprich | 2015-04-28 |
| 8968058 | Polishing pad with alignment feature | Robert Kerprich, Diane Scott | 2015-03-03 |
| 8920219 | Polishing pad with alignment aperture | Diane Scott, Rajeev Bajaj | 2014-12-30 |
| 8702479 | Polishing pad with multi-modal distribution of pore diameters | Ping Huang, Diane Scott, James P. LaCasse | 2014-04-22 |
| 8657653 | Homogeneous polishing pad for eddy current end-point detection | Diane Scott, Ping Huang, Richard L. Frentzel, Alexander William Simpson | 2014-02-25 |