| 11938584 |
Chemical mechanical planarization pads with constant groove volume |
Devin Schmitt, Jaeseok Lee, Eric Scott Moyer, Holland Hodges |
2024-03-26 |
| 11440158 |
Coated compressive subpad for chemical mechanical polishing |
Diane Scott |
2022-09-13 |
| 10946495 |
Low density polishing pad |
Ping Huang, William C. Allison, Richard L. Frentzel, Robert Kerprich, Diane Scott |
2021-03-16 |
| 10293459 |
Polishing pad having polishing surface with continuous protrusions |
William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more |
2019-05-21 |
| 10160092 |
Polishing pad having polishing surface with continuous protrusions having tapered sidewalls |
William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more |
2018-12-25 |
| 9931728 |
Polishing pad with foundation layer and polishing surface layer |
William C. Allison, Diane Scott, James P. LaCasse, Alexander William Simpson |
2018-04-03 |
| 9931729 |
Polishing pad with grooved foundation layer and polishing surface layer |
William C. Allison, Diane Scott, James P. LaCasse |
2018-04-03 |
| 9868185 |
Polishing pad with foundation layer and window attached thereto |
William C. Allison, Diane Scott, Jose I. Arno |
2018-01-16 |
| 9796063 |
Multi-layered chemical-mechanical planarization pad |
Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu, David Adam Wells +2 more |
2017-10-24 |
| 9649742 |
Polishing pad having polishing surface with continuous protrusions |
William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more |
2017-05-16 |
| 9597769 |
Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer |
William C. Allison, James P. LaCasse, Diane Scott, Alexander William Simpson, Ping Huang +1 more |
2017-03-21 |
| 9238294 |
Polishing pad having porogens with liquid filler |
William C. Allison |
2016-01-19 |
| 9162341 |
Chemical-mechanical planarization pad including patterned structural domains |
Anoop Mathew, Scott Xin Qiao, Guangwei Wu, David Adam Wells, Oscar K. Hsu |
2015-10-20 |
| 9067297 |
Polishing pad with foundation layer and polishing surface layer |
William C. Allison, Diane Scott, James P. LaCasse, Alexander William Simpson |
2015-06-30 |
| 9067298 |
Polishing pad with grooved foundation layer and polishing surface layer |
William C. Allison, Diane Scott, James P. LaCasse |
2015-06-30 |
| 8790165 |
Multi-layered chemical-mechanical planarization pad |
Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu, David Adam Wells +2 more |
2014-07-29 |
| 8758659 |
Method of grooving a chemical-mechanical planarization pad |
Oscar K. Hsu, David Adam Wells, John Erik Aldeborgh, Marc C. Jin, Guangwei Wu +1 more |
2014-06-24 |
| 8684794 |
Chemical mechanical planarization pad with void network |
Oscar K. Hsu, David Adam Wells, Scott Xin Qiao, Anoop Mathew, Guangwei Wu |
2014-04-01 |
| 8546260 |
Fabric containing non-crimped fibers and methods of manufacture |
Oscar K. Hsu |
2013-10-01 |
| 8491360 |
Three-dimensional network in CMP pad |
Oscar K. Hsu, David Adam Wells, Marc C. Jin, John Erik Aldeborgh |
2013-07-23 |
| 8435099 |
Chemical-mechanical planarization pad including patterned structural domains |
Anoop Mathew, Scott Xin Qiao, Guangwei Wu, David Adam Wells, Oscar K. Hsu |
2013-05-07 |
| 8430721 |
Chemical-mechanical planarization pad |
Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh, David Adam Wells |
2013-04-30 |
| 8377351 |
Polishing pad with controlled void formation |
David Adam Wells, Marc C. Jin, Oscar K. Hsu, John Erik Aldeborgh, Scott Xin Qiao +2 more |
2013-02-19 |
| 8172648 |
Chemical-mechanical planarization pad |
Oscar K. Hsu, Marc C. Jin, John Erik Aldeborgh, David Adam Wells |
2012-05-08 |
| 7985121 |
Chemical-mechanical planarization pad having end point detection window |
Oscar K. Hsu, David Adam Wells, John Erik Aldeborgh, Marc C. Jin |
2011-07-26 |