| 10946495 |
Low density polishing pad |
Ping Huang, William C. Allison, Richard L. Frentzel, Paul Andre Lefevre, Diane Scott |
2021-03-16 |
| 10293459 |
Polishing pad having polishing surface with continuous protrusions |
Paul Andre Lefevre, William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang +2 more |
2019-05-21 |
| 10160092 |
Polishing pad having polishing surface with continuous protrusions having tapered sidewalls |
Paul Andre Lefevre, William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang +2 more |
2018-12-25 |
| 9649742 |
Polishing pad having polishing surface with continuous protrusions |
Paul Andre Lefevre, William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang +2 more |
2017-05-16 |
| 9375823 |
Grooved CMP pads |
Karey Holland, Diane Scott, Sudhanshu Misra |
2016-06-28 |
| 9296085 |
Polishing pad with homogeneous body having discrete protrusions thereon |
Rajeev Bajaj, Ping Huang, William C. Allison, Richard L. Frentzel, Diane Scott |
2016-03-29 |
| 9249273 |
Polishing pad with alignment feature |
William C. Allison, Diane Scott |
2016-02-02 |
| 9180570 |
Grooved CMP pad |
Karey Holland, Diane Scott, Sudhanshu Misra |
2015-11-10 |
| 9156124 |
Soft polishing pad for polishing a semiconductor substrate |
William C. Allison, Diane Scott, Ping Huang, Richard L. Frentzel |
2015-10-13 |
| 9017140 |
CMP pad with local area transparency |
William C. Allison, Ping Huang, Diane Scott, Richard L. Frentzel |
2015-04-28 |
| 8968058 |
Polishing pad with alignment feature |
William C. Allison, Diane Scott |
2015-03-03 |
| 6272908 |
Flexural probe and method for examining a moving sensitive web surface |
Theodore R. Boccuzzi |
2001-08-14 |
