JA

John Erik Aldeborgh

IN Innopad: 6 patents #4 of 10Top 40%
FC Fns Tech Co.: 4 patents #6 of 15Top 40%
📍 Boxford, MA: #37 of 245 inventorsTop 20%
🗺 Massachusetts: #11,548 of 88,656 inventorsTop 15%
Overall (All Time): #461,303 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
9796063 Multi-layered chemical-mechanical planarization pad Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu +2 more 2017-10-24
9375822 Polishing pad having micro-grooves on the pad surface Oscar K. Hsu, Marc C. Jin, David Adam Wells 2016-06-28
8900036 Polishing pad having micro-grooves on the pad surface Oscar K. Hsu, Marc C. Jin, David Adam Wells 2014-12-02
8790165 Multi-layered chemical-mechanical planarization pad Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu +2 more 2014-07-29
8758659 Method of grooving a chemical-mechanical planarization pad Paul Andre Lefevre, Oscar K. Hsu, David Adam Wells, Marc C. Jin, Guangwei Wu +1 more 2014-06-24
8491360 Three-dimensional network in CMP pad Paul Andre Lefevre, Oscar K. Hsu, David Adam Wells, Marc C. Jin 2013-07-23
8430721 Chemical-mechanical planarization pad Oscar K. Hsu, Paul Andre Lefevre, Marc C. Jin, David Adam Wells 2013-04-30
8377351 Polishing pad with controlled void formation Paul Andre Lefevre, David Adam Wells, Marc C. Jin, Oscar K. Hsu, Scott Xin Qiao +2 more 2013-02-19
8172648 Chemical-mechanical planarization pad Paul Andre Lefevre, Oscar K. Hsu, Marc C. Jin, David Adam Wells 2012-05-08
8137166 Polishing pad having micro-grooves on the pad surface Oscar K. Hsu, Marc C. Jin, David Adam Wells 2012-03-20
7985121 Chemical-mechanical planarization pad having end point detection window Paul Andre Lefevre, Oscar K. Hsu, David Adam Wells, Marc C. Jin 2011-07-26