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Oscar K. Hsu

IN Innopad: 10 patents #1 of 10Top 10%
FC Fns Tech Co.: 6 patents #1 of 15Top 7%
FN Freudenberg Nonwovens: 5 patents #1 of 27Top 4%
IBM: 5 patents #18,733 of 70,183Top 30%
Overall (All Time): #164,272 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9796063 Multi-layered chemical-mechanical planarization pad Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, David Adam Wells +2 more 2017-10-24
9375822 Polishing pad having micro-grooves on the pad surface Marc C. Jin, David Adam Wells, John Erik Aldeborgh 2016-06-28
9162341 Chemical-mechanical planarization pad including patterned structural domains Paul Andre Lefevre, Anoop Mathew, Scott Xin Qiao, Guangwei Wu, David Adam Wells 2015-10-20
8900036 Polishing pad having micro-grooves on the pad surface Marc C. Jin, David Adam Wells, John Erik Aldeborgh 2014-12-02
8790165 Multi-layered chemical-mechanical planarization pad Paul Andre Lefevre, Anoop Mathew, Guangwei Wu, Scott Xin Qiao, David Adam Wells +2 more 2014-07-29
8758659 Method of grooving a chemical-mechanical planarization pad Paul Andre Lefevre, David Adam Wells, John Erik Aldeborgh, Marc C. Jin, Guangwei Wu +1 more 2014-06-24
8684794 Chemical mechanical planarization pad with void network Paul Andre Lefevre, David Adam Wells, Scott Xin Qiao, Anoop Mathew, Guangwei Wu 2014-04-01
8546260 Fabric containing non-crimped fibers and methods of manufacture Paul Andre Lefevre 2013-10-01
8491360 Three-dimensional network in CMP pad Paul Andre Lefevre, David Adam Wells, Marc C. Jin, John Erik Aldeborgh 2013-07-23
8435099 Chemical-mechanical planarization pad including patterned structural domains Paul Andre Lefevre, Anoop Mathew, Scott Xin Qiao, Guangwei Wu, David Adam Wells 2013-05-07
8430721 Chemical-mechanical planarization pad Paul Andre Lefevre, Marc C. Jin, John Erik Aldeborgh, David Adam Wells 2013-04-30
8377351 Polishing pad with controlled void formation Paul Andre Lefevre, David Adam Wells, Marc C. Jin, John Erik Aldeborgh, Scott Xin Qiao +2 more 2013-02-19
8172648 Chemical-mechanical planarization pad Paul Andre Lefevre, Marc C. Jin, John Erik Aldeborgh, David Adam Wells 2012-05-08
8137166 Polishing pad having micro-grooves on the pad surface Marc C. Jin, David Adam Wells, John Erik Aldeborgh 2012-03-20
7985121 Chemical-mechanical planarization pad having end point detection window Paul Andre Lefevre, David Adam Wells, John Erik Aldeborgh, Marc C. Jin 2011-07-26
7534163 Polishing pad Jean Vangsness, Alaka Potnis 2009-05-19
7357704 Polishing pad Jean Vangsness, Alaka Potnis 2008-04-15
7186166 Fiber embedded polishing pad Shyng-Tsong Chen, Kenneth M. Davis, Kenneth P. Rodbell, Jean Vangsness 2007-03-06
7086932 Polishing pad Jean Vangsness, Alaka Potnis 2006-08-08
6964604 Fiber embedded polishing pad Shyng-Tsong Chen, Kenneth M. Davis, Kenneth P. Rodbell, Jean Vangsness 2005-11-15
6890244 Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles Jean Vangsness, Scott C. Billings, David S. Gilbride 2005-05-10
6712681 Polishing pads with polymer filled fibrous web, and methods for fabricating and using same Shyng-Tsong Chen, Kenneth P. Rodbell, Jean Vangsness, David S. Gilbride, Scott C. Billings +1 more 2004-03-30
6656018 Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles Jean Vangsness, Scott C. Billings, David S. Gilbride 2003-12-02
6383066 Multilayered polishing pad, method for fabricating, and use thereof Shyng-Tsong Chen, Alex Siu Keung Chung, Kenneth P. Rodbell, Jean Vangsness 2002-05-07
6340325 Polishing pad grooving method and apparatus Shyng-Tsong Chen, Alex Siu Keung Chung, Kenneth M. Davis, Kenneth P. Rodbell 2002-01-22