Issued Patents All Time
Showing 101–112 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6261157 | Selective damascene chemical mechanical polishing | Fritz Redeker, John M. White, Shijian Li, Yutao Ma | 2001-07-17 |
| 6254459 | Wafer polishing device with movable window | Herbert E. Litvak, Rahul Surana, Stephen Jew, Jiri Pecen | 2001-07-03 |
| 6204169 | Processing for polishing dissimilar conductive layers in a semiconductor device | János Farkas, Sung-Cheol Kim, Jaime Saravia | 2001-03-20 |
| 6071816 | Method of chemical mechanical planarization using a water rinse to prevent particle contamination | David Watts, Sanjit Das | 2000-06-06 |
| 6068539 | Wafer polishing device with movable window | Herbert E. Litvak, Rahul Surana, Stephen Jew, Jiri Pecen | 2000-05-30 |
| 6045435 | Low selectivity chemical mechanical polishing (CMP) process for use on integrated circuit metal interconnects | Subramoney Iyer, Thom Kobayashi, Jaime Saravia, Mark G. Fernandes, David Watts | 2000-04-04 |
| 6001730 | Chemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layers | János Farkas, Melissa Freeman, David Watts, Sanjit Das | 1999-12-14 |
| 6001726 | Method for using a conductive tungsten nitride etch stop layer to form conductive interconnects and tungsten nitride contact structure | Rajan Nagabushnam, Ram Venkataraman, Shyam Mattay, Subramoney Iyer | 1999-12-14 |
| 5916011 | Process for polishing a semiconductor device substrate | Sung-Cheol Kim, Mark A. Zaleski | 1999-06-29 |
| 5899745 | Method of chemical mechanical polishing (CMP) using an underpad with different compression regions and polishing pad therefor | Sung-Cheol Kim, Lei Ping Lai, Adam W. Manzonie | 1999-05-04 |
| 5897375 | Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture | David Watts, Sanjit Das, János Farkas, Chelsea Dang, Melissa Freeman +3 more | 1999-04-27 |
| 5882243 | Method for polishing a semiconductor wafer using dynamic control | Sanjit Das, Subramoney Iyer, Olubunmi O. Adetutu | 1999-03-16 |