Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6204169 | Processing for polishing dissimilar conductive layers in a semiconductor device | Rajeev Bajaj, János Farkas, Sung-Cheol Kim | 2001-03-20 |
| 6045435 | Low selectivity chemical mechanical polishing (CMP) process for use on integrated circuit metal interconnects | Rajeev Bajaj, Subramoney Iyer, Thom Kobayashi, Mark G. Fernandes, David Watts | 2000-04-04 |
| 5897375 | Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture | David Watts, Rajeev Bajaj, Sanjit Das, János Farkas, Chelsea Dang +3 more | 1999-04-27 |