Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6096652 | Method of chemical mechanical planarization using copper coordinating ligands | David Watts, János Farkas, Jason Aquinde GOMEZ | 2000-08-01 |
| 5897375 | Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture | David Watts, Rajeev Bajaj, Sanjit Das, János Farkas, Melissa Freeman +3 more | 1999-04-27 |