Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10746816 | System and method for removing energy from an electrical choke | Douglas Link, Scott A. Walterman, Randy Hladilek, Timothy Strait, Margaret Ann Wiza | 2020-08-18 |
| 10481207 | Switching amplifier and method for estimating remaining lifetime of a switching amplifier | Juan Antonio Sabate, Louis M. Frigo, Pengcheng Zhu, Margaret Ann Wiza, Syedsaad Ali +4 more | 2019-11-19 |
| 10310038 | System and method for supplying electrical power to a gradient amplifier | Margaret Ann Wiza, Syed S. Ali, Douglas Link, Michael Rose, Tanzania Sewell | 2019-06-04 |
| 10247795 | Method and apparatus for non-invasive assessment of ripple cancellation filter | Louis M. Frigo, Margaret Ann Wiza, Douglas Link, Michael Rose, Scott Richard Weber +1 more | 2019-04-02 |
| 10185141 | Cascaded electrical device bus structure systems and methods | Ruxi Wang, Douglas Link, Fengfeng Tao, Juan Antonio Sabate, Eladio Clemente Delgado | 2019-01-22 |
| 10141909 | Method and apparatus for dual notch ripple filtering | Thomas George McFarland, Margaret Ann Wiza, Douglas Link | 2018-11-27 |
| 10132852 | Method and apparatus for active load impedance monitoring | Margaret Ann Wiza, Louis M. Frigo, Douglas Link, Michael Rose, Andrew John Panos | 2018-11-20 |
| 10101417 | Methods and devices for RF coils in MRI systems | Andreas Ebel, Clyve Konrad Rosales Follante, Hyokwon Nam | 2018-10-16 |
| 9893705 | Method and apparatus for dual notch ripple filtering | Thomas George McFarland, Margaret Ann Wiza, Douglas Link | 2018-02-13 |
| 6001730 | Chemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layers | János Farkas, Rajeev Bajaj, David Watts, Sanjit Das | 1999-12-14 |
| 5935871 | Process for forming a semiconductor device | János Farkas, David Watts | 1999-08-10 |
| 5897375 | Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture | David Watts, Rajeev Bajaj, Sanjit Das, János Farkas, Chelsea Dang +3 more | 1999-04-27 |
| 5863838 | Method for chemically-mechanically polishing a metal layer | János Farkas | 1999-01-26 |
| 5773364 | Method for using ammonium salt slurries for chemical mechanical polishing (CMP) | János Farkas | 1998-06-30 |