MZ

Mark A. Zaleski

Globalfoundries: 16 patents #218 of 4,424Top 5%
Motorola: 3 patents #3,303 of 12,470Top 30%
Micron: 3 patents #3,077 of 6,345Top 50%
🗺 New York: #6,154 of 115,490 inventorsTop 6%
Overall (All Time): #191,350 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
11903183 Conductive line contact regions having multiple multi-direction conductive lines and staircase conductive line contact structures for semiconductor devices Byung Yoon Kim, Sheng-Wei Yang, Si-Woo Lee 2024-02-13
11696432 Multi-direction conductive line and staircase contact for semiconductor devices Si-Woo Lee, Byung Yoon Kim, Kyuseok Lee, Sangmin Hwang 2023-07-04
10833087 Semiconductor devices including transistors comprising a charge trapping material, and related systems and methods Fredrick Fishburn, Haitao Liu, Soichi Sugiura, Oscar O. Enomoto, Keisuke Hirofuji +4 more 2020-11-10
10396026 Precut metal lines Andy Wei, Guillaume Bouche 2019-08-27
10181420 Devices with chamfer-less vias multi-patterning and methods for forming chamfer-less vias Jason E. Stephens, David Permana, Guillaume Bouche, Andy Wei, Anbu Selvam K M Mahalingam +6 more 2019-01-15
10056373 Transistor contacts self-aligned in two dimensions Andy Wei, Guillaume Bouche, Tuhin Guha Neogi, Jason E. Stephens, Jongwook Kye +1 more 2018-08-21
9842801 Self-aligned via and air gap Andy Wei 2017-12-12
9679805 Self-aligned back end of line cut Guillaume Bouche, Andy Wei 2017-06-13
9660040 Transistor contacts self-aligned two dimensions Andy Wei, Guillaume Bouche, Tuhin Guha Neogi, Jason E. Stephens, Jongwook Kye +1 more 2017-05-23
9508642 Self-aligned back end of line cut Guillaume Bouche, Andy Wei 2016-11-29
9502528 Borderless contact formation through metal-recess dual cap integration Guillaume Bouche, Jason E. Stephens, Tuhin Guha Neogi, Andy Wei 2016-11-22
9461128 Method for creating self-aligned transistor contacts Andy Wei, Jason E. Stephens, Tuhin Guha Neogi, Guillaume Bouche 2016-10-04
9368395 Self-aligned via and air gap Andy Wei 2016-06-14
9362162 Methods of fabricating BEOL interlayer structures Sunil Kumar Singh, Ravi Prakash Srivastava, Teck Jung Tang 2016-06-07
9293363 Methods and structures for back end of line integration Sunil Kumar Singh, Ravi Prakash Srivastava, Akshey Sehgal 2016-03-22
9263325 Precut metal lines Andy Wei, Guillaume Bouche 2016-02-16
9236437 Method for creating self-aligned transistor contacts Andy Wei, Jason E. Stephens, Tuhin Guha Neogi, Guillaume Bouche 2016-01-12
9202751 Transistor contacts self-aligned in two dimensions Andy Wei, Guillaume Bouche, Tuhin Guha Neogi, Jason E. Stephens, Jongwook Kye +1 more 2015-12-01
9117822 Methods and structures for back end of line integration Sunil Kumar Singh, Ravi Prakash Srivastava, Akshey Sehgal 2015-08-25
5916011 Process for polishing a semiconductor device substrate Sung-Cheol Kim, Rajeev Bajaj 1999-06-29
5707492 Metallized pad polishing process Charles Stager, Thomas S. Kobayashi, Joseph E. Page, Jr., Paul M. Winebarger 1998-01-13
5478436 Selective cleaning process for fabricating a semiconductor device Paul M. Winebarger, Troy B. Morrison, Jeffrey Sultemeier 1995-12-26