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Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
Saket Chadda, Rahul Jairath, Wilbur C. Krusell |
2003-09-16 |
| 6261155 |
Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
Rahul Jairath, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl |
2001-07-17 |
| 6254459 |
Wafer polishing device with movable window |
Rajeev Bajaj, Herbert E. Litvak, Rahul Surana, Stephen Jew |
2001-07-03 |
| 6146248 |
Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
Rahul Jairath, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl |
2000-11-14 |
| 6111634 |
Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing |
John Fielden, Saket Chadda, Lloyd J. LaComb, JR., Rahul Jairath, Wilbur C. Krusell |
2000-08-29 |
| 6108091 |
Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
Saket Chadda, Rahul Jairath, Wilbur C. Krusell |
2000-08-22 |
| 6068539 |
Wafer polishing device with movable window |
Rajeev Bajaj, Herbert E. Litvak, Rahul Surana, Stephen Jew |
2000-05-30 |
| 5083035 |
Position location in surface scanning using interval timing between scan marks on test wafers |
Kenneth P. Gross, Brian C. Leslie, George Kren |
1992-01-21 |
| 4766324 |
Particle detection method including comparison between sequential scans |
Soheil Saadat, Armand P. Neukermans, George Kren |
1988-08-23 |
| 4641967 |
Particle position correlator and correlation method for a surface scanner |
— |
1987-02-10 |
| 4512659 |
Apparatus for calibrating a surface scanner |
Lee K. Galbraith |
1985-04-23 |
