Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10762524 | Data platform and analytics for predicting media metrics | Nicola Sarah Vanessa Poynter, Suchit Malhotra, Shaifali Panwar, Saurabh Kumar Singh, Julian Richard Taverner Smith | 2020-09-01 |
| 6855239 | Plating method and apparatus using contactless electrode | — | 2005-02-15 |
| 6656025 | Integrated pad and belt for chemical mechanical polishing | Anil K. Pant, Kamal Mishra, Saket Chadda, Wilbur C. Krusell | 2003-12-02 |
| 6621584 | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing | Jiri Pecen, Saket Chadda, Wilbur C. Krusell | 2003-09-16 |
| 6517418 | Method of transporting a semiconductor wafer in a wafer polishing system | Erik H. Engdahl, Edward T. Ferri, Jr., Wilbur C. Krusell | 2003-02-11 |
| 6336845 | Method and apparatus for polishing semiconductor wafers | Erik H. Engdahl, Edward T. Ferri, Jr., Wilbur C. Krusell, Randall L. Green, Anil K. Pant | 2002-01-08 |
| 6328642 | Integrated pad and belt for chemical mechanical polishing | Anil K. Pant, Kamal Mishra, Saket Chadda, Wilbur C. Krusell | 2001-12-11 |
| 6261155 | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher | Jiri Pecen, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl | 2001-07-17 |
| 6146248 | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher | Jiri Pecen, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl | 2000-11-14 |
| 6111634 | Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing | Jiri Pecen, John Fielden, Saket Chadda, Lloyd J. LaComb, JR., Wilbur C. Krusell | 2000-08-29 |
| 6108091 | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing | Jiri Pecen, Saket Chadda, Wilbur C. Krusell | 2000-08-22 |
| 5913714 | Method for dressing a polishing pad during polishing of a semiconductor wafer | Konstantin Volodarsky | 1999-06-22 |
| 5866031 | Slurry formulation for chemical mechanical polishing of metals | Ronald A. Carpio, Jayashree Kalpathy-Cramer | 1999-02-02 |
| 5857899 | Wafer polishing head with pad dressing element | Konstantin Volodarsky | 1999-01-12 |
| 5762536 | Sensors for a linear polisher | Anil K. Pant, Joseph R. Breivogel, Douglas W. Young, Erik H. Engdahl | 1998-06-09 |
| 5688360 | Method and apparatus for polishing a semiconductor substrate wafer | — | 1997-11-18 |
| 5665656 | Method and apparatus for polishing a semiconductor substrate wafer | — | 1997-09-09 |
| 5614444 | Method of using additives with silica-based slurries to enhance selectivity in metal CMP | János Farkas, Matt Stell, Sing-Mo Tzeng | 1997-03-25 |
| 5478435 | Point of use slurry dispensing system | James J. Murphy, János Farkas, Lucia C. Markert | 1995-12-26 |