EE

Erik H. Engdahl

Lam Research: 12 patents #236 of 2,128Top 15%
SG Silicon Valley Group: 1 patents #31 of 97Top 35%
📍 Anaheim, CA: #76 of 1,337 inventorsTop 6%
🗺 California: #46,935 of 386,348 inventorsTop 15%
Overall (All Time): #388,945 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
6746320 Linear reciprocating disposable belt polishing method and apparatus Wilbur C. Krusell, Glenn W. Travis, James Bagley 2004-06-08
6729945 Apparatus for controlling leading edge and trailing edge polishing Cangshan Xu, Jeff Gasparitsch, Robert Taff, Kenneth J. Bahng, Paul H. Stasiewicz 2004-05-04
6716093 Low friction gimbaled substrate holder for CMP apparatus Michael D. Steiman, Paul H. Stasiewicz 2004-04-06
6645046 Conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers Michael Vogtmann, Chris Frederickson, Jeff Gasparitsch, Gene Hempel 2003-11-11
6517418 Method of transporting a semiconductor wafer in a wafer polishing system Edward T. Ferri, Jr., Wilbur C. Krusell, Rahul Jairath 2003-02-11
6500056 Linear reciprocating disposable belt polishing method and apparatus Wilbur C. Krusell, Glenn W. Travis, James Bagley 2002-12-31
6428394 Method and apparatus for chemical mechanical planarization and polishing of semiconductor wafers using a continuous polishing member feed Ben Mooring, Wilbur C. Krusell, Glenn W. Travis 2002-08-06
6336845 Method and apparatus for polishing semiconductor wafers Edward T. Ferri, Jr., Wilbur C. Krusell, Rahul Jairath, Randall L. Green, Anil K. Pant 2002-01-08
6261155 Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher Rahul Jairath, Jiri Pecen, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini 2001-07-17
6224461 Method and apparatus for stabilizing the process temperature during chemical mechanical polishing Robert G. Boehm, Jr., Anil K. Pant, Wilbur C. Krusell 2001-05-01
6146248 Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher Rahul Jairath, Jiri Pecen, Saket Chadda, Wilbur C. Krusell, Jerauld J. Cutini 2000-11-14
5762536 Sensors for a linear polisher Anil K. Pant, Joseph R. Breivogel, Douglas W. Young, Rahul Jairath 1998-06-09
5618351 Thermal processing apparatus and process Terry A. Koble, Jr., Anthony Dip, Ian Roger Oliver, Christopher Ratliff 1997-04-08