| 6095904 |
Orbital motion chemical-mechanical polishing method and apparatus |
Samuel F. Louke, Michael R. Oliver, Leopoldo D. Yau, Christopher E. Barns |
2000-08-01 |
| 6083089 |
Method and apparatus for chemical mechanical polishing |
Matthew J. Prince, Christopher E. Barns |
2000-07-04 |
| 5916012 |
Control of chemical-mechanical polishing rate across a substrate surface for a linear polisher |
Anil K. Pant, Douglas W. Young, Robert M. Rivera |
1999-06-29 |
| 5871390 |
Method and apparatus for aligning and tensioning a pad/belt used in linear planarization for chemical mechanical polishing |
Anil K. Pant, Douglas W. Young, Konstantin Volodarski, Leon Volfovski |
1999-02-16 |
| 5762536 |
Sensors for a linear polisher |
Anil K. Pant, Douglas W. Young, Rahul Jairath, Erik H. Engdahl |
1998-06-09 |
| 5635083 |
Method and apparatus for chemical-mechanical polishing using pneumatic pressure applied to the backside of a substrate |
Matthew J. Prince, Christopher E. Barns |
1997-06-03 |
| 5554064 |
Orbital motion chemical-mechanical polishing apparatus and method of fabrication |
Samuel F. Louke, Michael R. Oliver, Leopoldo D. Yau, Christopher E. Barns |
1996-09-10 |
| 5547417 |
Method and apparatus for conditioning a semiconductor polishing pad |
Matthew J. Price, Christopher E. Barns |
1996-08-20 |
| 5216843 |
Polishing pad conditioning apparatus for wafer planarization process |
Loren R. Blanchard, Matthew J. Prince |
1993-06-08 |
| 5212910 |
Composite polishing pad for semiconductor process |
Sam F. Louke, Michael R. Oliver, Leo D. Yau |
1993-05-25 |
