| RE38674 |
Process for forming a thin oxide layer |
Robert S. Chau, William Hargrove |
2004-12-21 |
| 6326664 |
Transistor with ultra shallow tip and method of fabrication |
Robert S. Chau, Chan-Hong Chern, Chia-Hong Jan, Kevin R. Weldon, Paul Packan |
2001-12-04 |
| 6165826 |
Transistor with low resistance tip and method of fabrication in a CMOS process |
Robert S. Chau, Chia-Hong Jan, Chan-Hong Chern |
2000-12-26 |
| 6139404 |
Apparatus and a method for conditioning a semiconductor wafer polishing pad |
— |
2000-10-31 |
| 6095904 |
Orbital motion chemical-mechanical polishing method and apparatus |
Joseph R. Breivogel, Samuel F. Louke, Michael R. Oliver, Christopher E. Barns |
2000-08-01 |
| 5863832 |
Capping layer in interconnect system and method for bonding the capping layer onto the interconnect system |
Brian S. Doyle, Quat T. Yu |
1999-01-26 |
| 5856697 |
Integrated dual layer emitter mask and emitter trench for BiCMOS processes |
Stephen Chambers, Brian J. Brown, Chan-Hong Chern, Robert S. Chau |
1999-01-05 |
| 5783478 |
Method of frabricating a MOS transistor having a composite gate electrode |
Robert S. Chau, David B. Fraser, Kenneth Cadien, Gopal Raghavan |
1998-07-21 |
| 5710450 |
Transistor with ultra shallow tip and method of fabrication |
Robert S. Chau, Chan-Hong Chern, Chia-Hong Jan, Kevin R. Weldon, Paul Packan |
1998-01-20 |
| 5625217 |
MOS transistor having a composite gate electrode and method of fabrication |
Robert S. Chau, David B. Fraser, Kenneth Cadien, Gopal Raghavan |
1997-04-29 |
| 5611943 |
Method and apparatus for conditioning of chemical-mechanical polishing pads |
Kenneth Cadien |
1997-03-18 |
| 5595526 |
Method and apparatus for endpoint detection in a chemical/mechanical process for polishing a substrate |
Paul B. Fischer |
1997-01-21 |
| 5554064 |
Orbital motion chemical-mechanical polishing apparatus and method of fabrication |
Joseph R. Breivogel, Samuel F. Louke, Michael R. Oliver, Christopher E. Barns |
1996-09-10 |
| 5488003 |
Method of making emitter trench BiCMOS using integrated dual layer emitter mask |
Stephen Chambers, Brian J. Brown, Chan-Hong Chern, Robert S. Chau |
1996-01-30 |
| 5434093 |
Inverted spacer transistor |
Robert S. Chau, Chan-Hong Chern, Shahriar Ahmed, Robert Hainsey, Robert J. Stoner +1 more |
1995-07-18 |
| 5244843 |
Process for forming a thin oxide layer |
Robert S. Chau, William Hargrove |
1993-09-14 |
| 5104819 |
Fabrication of interpoly dielctric for EPROM-related technologies |
Philip E. Freiberger, Cheng Pan, George E. Sery |
1992-04-14 |
| 4917044 |
Electrical contact apparatus for use with plasma or glow discharge reaction chamber |
Galen H. Kawamoto |
1990-04-17 |
| 4837185 |
Pulsed dual radio frequency CVD process |
Galen H. Kawamoto |
1989-06-06 |
| 4786612 |
Plasma enhanced chemical vapor deposited vertical silicon nitride resistor |
Shih-Ou Chen, Yih-Shung Lin |
1988-11-22 |
| 4755480 |
Method of making a silicon nitride resistor using plasma enhanced chemical vapor deposition |
Shih-Ou Chen, Yih-Shung Lin |
1988-07-05 |
| 4690728 |
Pattern delineation of vertical load resistor |
Chi-Hwa Tsang, Galen H. Kawamoto |
1987-09-01 |
| 4620986 |
MOS rear end processing |
Robert A. Gasser, Kenneth R. Week, Jr., Jick Yu, David D. Chin |
1986-11-04 |
| 4587138 |
MOS rear end processing |
Robert A. Gasser, Kenneth R. Week, Jr., Jick Yu, David D. Chin |
1986-05-06 |