| 12446258 |
Thin film semiconductor switching device |
Douglas Barlage, Lhing Gem SHOUTE, Alex Munnlick MA, Eric Wilson MILBURN |
2025-10-14 |
|
| 12302605 |
Hafnium nitride adhesion layer |
Michael David Clark, Katherine COOK, Korel DAWKINS |
2025-05-13 |
|
| 11949019 |
Thin film semiconductor switching device |
Douglas Barlage, Lhing Gem SHOUTE, Alex Munnlick MA, Eric Wilson MILBURN |
2024-04-02 |
|
| 10830738 |
Ultrasensitive high Q-factor AT-cut-quartz crystal microbalance femtogram mass sensor |
Selemani Seif Mziray, Thomas G. Thundat |
2020-11-10 |
|
| 8829442 |
Non-contact measurement of the dopant content of semiconductor layers |
E. Michael Heaven, Gordon Matthew Deans, Stephen Warren Blaine |
2014-09-09 |
|
| 7800371 |
Portable NMR device and method for making and using the same |
Chang-Min Park, Shriram Ramanathan, Patrick Morrow |
2010-09-21 |
$10,255,000 |
| 7666465 |
Introducing nanotubes in trenches and structures formed thereby |
Paul B. Fischer, Anne Miller, Chris Barns |
2010-02-23 |
$16,403,000 |
| 7476974 |
Method to fabricate interconnect structures |
Tatyana N. Andreyushchenko, Paul B. Fischer, Valery M. Dubin |
2009-01-13 |
$20,447,000 |
| 7345479 |
Portable NMR device and method for making and using the same |
Chang-Min Park, Shriram Ramanathan, Patrick Morrow |
2008-03-18 |
$17,443,000 |
| 7319323 |
Device and method using magnetic pattern on disk |
Chang-Min Park, Shriram Ramanathan |
2008-01-15 |
$20,135,000 |
| 7274191 |
Integrated on-chip NMR and ESR device and method for making and using the same |
Chang-Min Park, Shriram Ramanathan, Patrick Morrow |
2007-09-25 |
$25,540,000 |
| 7182882 |
Method of improving chemical mechanical polish endpoint signals by use of chemical additives |
Allen D. Feller |
2007-02-27 |
$10,067,000 |
| 7087517 |
Method to fabricate interconnect structures |
Tatyana N. Andreyushchenko, Paul B. Fischer, Valery M. Dubin |
2006-08-08 |
$12,359,000 |
| 7087188 |
Abrasives for chemical mechanical polishing |
A. Feller |
2006-08-08 |
$12,359,000 |
| 6909193 |
High pH slurry for chemical mechanical polishing of copper |
Anne Miller, A. Feller |
2005-06-21 |
$21,477,000 |
| 6881674 |
Abrasives for chemical mechanical polishing |
A. Feller |
2005-04-19 |
$25,408,000 |
| 6825117 |
High PH slurry for chemical mechanical polishing of copper |
Anne Miller, A. Feller |
2004-11-30 |
$36,984,000 |
| 6752844 |
Ceric-ion slurry for use in chemical-mechanical polishing |
Anne Miller, A. Feller |
2004-06-22 |
$27,859,000 |
| 6740591 |
Slurry and method for chemical mechanical polishing of copper |
Anne Miller, A. Feller |
2004-05-25 |
$32,256,000 |
| 6719614 |
Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing |
Anne Miller, A. Feller |
2004-04-13 |
$35,249,000 |
| 6464568 |
Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing |
Anne Miller, A. Feller |
2002-10-15 |
$56,657,000 |
| 6443814 |
Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing |
Anne Miller, A. Feller |
2002-09-03 |
$41,426,000 |
| 6375552 |
Slurries for chemical mechanical polishing |
Daniel A. Feller |
2002-04-23 |
$65,430,000 |
| 6358853 |
Ceria based slurry for chemical-mechanical polishing |
Allen D. Feller, Mark Buehler, Paul B. Fischer |
2002-03-19 |
$110,581,000 |
| 6178585 |
Slurries for chemical mechanical polishing |
Daniel A. Feller |
2001-01-30 |
$161,472,000 |
