Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12146736 | Metrology system | Derek Aqui, Mark Baker, Robert Batten, Shawn Boling, Jared Greco +2 more | 2024-11-19 |
| 11486689 | Metrology system | Derek Aqui, Mark Baker, Robert Batten, Shawn Boling, Jared Greco +2 more | 2022-11-01 |
| 10598521 | Metrology system | Derek Aqui, Mark Baker, Robert Batten, Shawn Boling, Jared Greco +2 more | 2020-03-24 |
| 8148786 | Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate | Jack T. Kavalieros, Annalisa Cappellani, Justin K. Brask, Mark L. Doczy, Matthew V. Metz +2 more | 2012-04-03 |
| 7883951 | CMOS device with metal and silicide gate electrodes and a method for making it | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Matthew V. Metz, Uday Shah +3 more | 2011-02-08 |
| 7754552 | Preventing silicide formation at the gate electrode in a replacement metal gate technology | Justin K. Brask, Mark L. Doczy | 2010-07-13 |
| 7671471 | Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Matthew V. Metz +3 more | 2010-03-02 |
| 7666465 | Introducing nanotubes in trenches and structures formed thereby | Paul B. Fischer, Anne Miller, Kenneth Cadien | 2010-02-23 |
| 7569443 | Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate | Jack T. Kavalieros, Annalisa Cappellani, Justin K. Brask, Mark L. Doczy, Matthew V. Metz +2 more | 2009-08-04 |
| 7422936 | Facilitating removal of sacrificial layers via implantation to form replacement metal gates | Matt Prince, Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros | 2008-09-09 |
| 7355281 | Method for making semiconductor device having a high-k gate dielectric layer and a metal gate electrode | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Matthew V. Metz +3 more | 2008-04-08 |
| 7316949 | Integrating n-type and p-type metal gate transistors | Mark L. Doczy, Justin K. Brask, Steven J. Keating, Brian S. Doyle, Michael L. McSwiney +2 more | 2008-01-08 |
| 7294931 | Method and apparatus for selective deposition | — | 2007-11-13 |
| 7271045 | Etch stop and hard mask film property matching to enable improved replacement metal gate process | Matthew J. Prince, Justin K. Brask | 2007-09-18 |
| 7239019 | Selectively converted inter-layer dielectric | Jihperng Leu, Grant Kloster, David H. Gracias, Lee Rockford, Peter K. Moon | 2007-07-03 |
| 7238610 | Method and apparatus for selective deposition | — | 2007-07-03 |
| 7220635 | Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Uday Shah, Matthew V. Metz +3 more | 2007-05-22 |
| 7217611 | Methods for integrating replacement metal gate structures | Jack T. Kavalieros, Justin K. Brask, Mark L. Doczy, Scott A. Hareland, Matthew V. Metz +1 more | 2007-05-15 |
| 7208361 | Replacement gate process for making a semiconductor device that includes a metal gate electrode | Uday Shah, Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Matthew V. Metz +1 more | 2007-04-24 |
| 7205236 | Semiconductor substrate polishing methods and equipment | Paul B. Fischer | 2007-04-17 |
| 7183184 | Method for making a semiconductor device that includes a metal gate electrode | Mark L. Doczy, Justin K. Brask, Jack T. Kavalieros, Uday Shah, Robert S. Chau | 2007-02-27 |
| 7166506 | Poly open polish process | Matthew J. Prince, Francis M. Tambwe | 2007-01-23 |
| 7157378 | Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode | Justin K. Brask, Mark L. Doczy, Uday Shah, Jack T. Kavalieros, Matthew V. Metz +3 more | 2007-01-02 |
| 7153784 | Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode | Justin K. Brask, Jack T. Kavalieros, Mark L. Doczy, Uday Shah, Matthew V. Metz +3 more | 2006-12-26 |
| 7153734 | CMOS device with metal and silicide gate electrodes and a method for making it | Justin K. Brask, Mark L. Doczy, Jack T. Kavalieros, Matthew V. Metz, Uday Shah +3 more | 2006-12-26 |