Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6905526 | Fabrication of an ion exchange polish pad | Sanjay Dabral | 2005-06-14 |
| 6773337 | Method and apparatus to recondition an ion exchange polish pad | Sanjay Dabral | 2004-08-10 |
| 6722950 | Method and apparatus for electrodialytic chemical mechanical polishing and deposition | Sanjay Dabral | 2004-04-20 |
| 6656025 | Integrated pad and belt for chemical mechanical polishing | Rahul Jairath, Kamal Mishra, Saket Chadda, Wilbur C. Krusell | 2003-12-02 |
| 6425812 | Polishing head for chemical mechanical polishing using linear planarization technology | Douglas W. Young, Glenn W. Travis, Konstantin Volodarsky, Andrew J. Nagengast | 2002-07-30 |
| 6416385 | Method and apparatus for polishing semiconductor wafers | Edward T. Ferri, Jr., Randall L. Green | 2002-07-09 |
| 6336845 | Method and apparatus for polishing semiconductor wafers | Erik H. Engdahl, Edward T. Ferri, Jr., Wilbur C. Krusell, Rahul Jairath, Randall L. Green | 2002-01-08 |
| 6328642 | Integrated pad and belt for chemical mechanical polishing | Rahul Jairath, Kamal Mishra, Saket Chadda, Wilbur C. Krusell | 2001-12-11 |
| 6325706 | Use of zeta potential during chemical mechanical polishing for end point detection | Wilbur C. Krusell, Andrew J. Nagengast | 2001-12-04 |
| 6224461 | Method and apparatus for stabilizing the process temperature during chemical mechanical polishing | Robert G. Boehm, Jr., Wilbur C. Krusell, Erik H. Engdahl | 2001-05-01 |
| 6186865 | Apparatus and method for performing end point detection on a linear planarization tool | Brian Thornton, Andrew J. Nagengast, Robert G. Boehm, Jr., Wilbur C. Krusell | 2001-02-13 |
| 6132289 | Apparatus and method for film thickness measurement integrated into a wafer load/unload unit | Michael Labunsky, Andrew J. Nagengast | 2000-10-17 |
| 5916012 | Control of chemical-mechanical polishing rate across a substrate surface for a linear polisher | Joseph R. Breivogel, Douglas W. Young, Robert M. Rivera | 1999-06-29 |
| 5871390 | Method and apparatus for aligning and tensioning a pad/belt used in linear planarization for chemical mechanical polishing | Douglas W. Young, Joseph R. Breivogel, Konstantin Volodarski, Leon Volfovski | 1999-02-16 |
| 5800248 | Control of chemical-mechanical polishing rate across a substrate surface | Douglas W. Young, Anthony Meyer, Konstantin Volodarsky, David E. Weldon | 1998-09-01 |
| 5762536 | Sensors for a linear polisher | Joseph R. Breivogel, Douglas W. Young, Rahul Jairath, Erik H. Engdahl | 1998-06-09 |