Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6328637 | Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization | Michael Labunsky, Tac Huynh, Andrew J. Nagengast, Glenn W. Travis | 2001-12-11 |
| 6086460 | Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization | Michael Labunsky, Tac Huynh, Andrew J. Nagengast, Glenn W. Travis | 2000-07-11 |
| 5800248 | Control of chemical-mechanical polishing rate across a substrate surface | Anil K. Pant, Douglas W. Young, Konstantin Volodarsky, David E. Weldon | 1998-09-01 |
| 5722877 | Technique for improving within-wafer non-uniformity of material removal for performing CMP | Thomas G. Mallon, Bradley Scott Withers, Douglas W. Young | 1998-03-03 |