| 7316602 |
Constant low force wafer carrier for electrochemical mechanical processing and chemical mechanical polishing |
Bulent M. Basol, Jalal Ashjaee |
2008-01-08 |
| 6988932 |
Apparatus of sealing wafer backside for full-face processing |
Jalal Ashjaee, Homayoun Talieh, Bulent M. Basol |
2006-01-24 |
| 6969456 |
Method of using vertically configured chamber used for multiple processes |
Boguslaw Nagorski, Rimma Volodarsky, Douglas W. Young, Cyprian Emeka Uzoh, Homayoun Talieh |
2005-11-29 |
| 6939206 |
Method and apparatus of sealing wafer backside for full-face electrochemical plating |
Jalal Ashjaee, Homayoun Talieh, Bulent M. Basol |
2005-09-06 |
| 6932679 |
Apparatus and method for loading a wafer in polishing system |
Homayoun Talieh, Jalal Ashjaee, Douglas W. Young |
2005-08-23 |
| 6884334 |
Vertically configured chamber used for multiple processes |
Boguslaw A. Nigorski, Rimma Volodarsky, Douglas W. Young, Cyprian Emeka Uzoh, Homayoun Talieh |
2005-04-26 |
| 6855037 |
Method of sealing wafer backside for full-face electrochemical plating |
Jalal Ashjaee, Homayoun Talieh, Bulent M. Basol |
2005-02-15 |
| 6773576 |
Anode assembly for plating and planarizing a conductive layer |
Rimma Volodarsky, Cyprian Emeka Uzoh, Homayoun Talieh, Douglas W. Young |
2004-08-10 |
| 6716084 |
Carrier head for holding a wafer and allowing processing on a front face thereof to occur |
Bulent M. Basol, Cyprian Emeka Uzoh |
2004-04-06 |
| 6612915 |
Work piece carrier head for plating and polishing |
Cyprian Emeka Uzoh, Boguslaw Nagorski, Douglas W. Young |
2003-09-02 |
| 6604988 |
Polishing apparatus and method with belt drive system adapted to extend the lifetime of a refreshing polishing belt provided therein |
Homayoun Talieh, Jalal Ashjaee, Douglas W. Young |
2003-08-12 |
| 6533646 |
Polishing head with removable subcarrier |
— |
2003-03-18 |
| 6478936 |
Anode assembly for plating and planarizing a conductive layer |
Rimma Volodarsky, Cyprian Emeka Uzoh, Homayoun Talieh, Douglas W. Young |
2002-11-12 |
| 6468139 |
Polishing apparatus and method with a refreshing polishing belt and loadable housing |
Homayoun Talieh, Jalal Ashjaee, Douglas W. Young |
2002-10-22 |
| 6464571 |
Polishing apparatus and method with belt drive system adapted to extend the lifetime of a refreshing polishing belt provided therein |
Homayoun Talieh, Jalal Ashjaee, Douglas W. Young |
2002-10-15 |
| 6454332 |
Apparatus and methods for handling a substrate |
Boris Govzman, Leon Volfovski |
2002-09-24 |
| 6425812 |
Polishing head for chemical mechanical polishing using linear planarization technology |
Anil K. Pant, Douglas W. Young, Glenn W. Travis, Andrew J. Nagengast |
2002-07-30 |
| 6352623 |
Vertically configured chamber used for multiple processes |
Boguslaw Nagorski, Rimma Volodarsky, Douglas W. Young, Cyprian Emeka Uzoh, Homayoun Talieh |
2002-03-05 |
| 6244946 |
Polishing head with removable subcarrier |
— |
2001-06-12 |
| 5913714 |
Method for dressing a polishing pad during polishing of a semiconductor wafer |
Rahul Jairath |
1999-06-22 |
| 5857899 |
Wafer polishing head with pad dressing element |
Rahul Jairath |
1999-01-12 |
| 5803799 |
Wafer polishing head |
David E. Weldon |
1998-09-08 |
| 5800248 |
Control of chemical-mechanical polishing rate across a substrate surface |
Anil K. Pant, Douglas W. Young, Anthony Meyer, David E. Weldon |
1998-09-01 |
