Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12159964 | Light-emitting diode device containing microlenses and method of making the same | Brian Kim, Ivan Huang | 2024-12-03 |
| 12074251 | Semiconductor device containing stress relaxation layer and method of making thereof | Zhen Chen | 2024-08-27 |
| 11973172 | Subpixel light emitting diodes for direct view display and methods of making the same | Anusha Pokhriyal, Zulal Tezcan OZEL | 2024-04-30 |
| 9318466 | Method for electronic circuit assembly on a paper substrate | Ramakanth Alapati, Adam BEECE | 2016-04-19 |
| 8268135 | Method and apparatus for electrochemical planarization of a workpiece | Ismail Emesh, Nikolay Korovin, Brian L. Mueller | 2012-09-18 |
| 7998877 | Diffraction grating in conjunction with reduced thickness to increase efficiency of solar cells | — | 2011-08-16 |
| 7229343 | Orbiting indexable belt polishing station for chemical mechanical polishing | Timothy Dyer, Clinton O. Fruitman | 2007-06-12 |
| 7033464 | Apparatus for electrochemically depositing a material onto a workpiece surface | Ismail Emesh | 2006-04-25 |
| 7025860 | Method and apparatus for the electrochemical deposition and removal of a material on a workpiece surface | — | 2006-04-11 |
| 6974525 | Method and apparatus for electrochemical planarization of a workpiece | Ismail Emesh, Nikolay Korovin, Brian L. Mueller | 2005-12-13 |
| 6849547 | Apparatus and process for polishing a workpiece | Ismail Emesh, Brian L. Mueller | 2005-02-01 |
| 6793565 | Orbiting indexable belt polishing station for chemical mechanical polishing | Timothy Dyer, Clinton O. Fruitman | 2004-09-21 |
| 6736952 | Method and apparatus for electrochemical planarization of a workpiece | Ismail Emesh, Nikolay Korovin, Brian L. Mueller | 2004-05-18 |
| 6656025 | Integrated pad and belt for chemical mechanical polishing | Anil K. Pant, Rahul Jairath, Kamal Mishra, Wilbur C. Krusell | 2003-12-02 |
| 6621584 | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing | Jiri Pecen, Rahul Jairath, Wilbur C. Krusell | 2003-09-16 |
| 6572755 | Method and apparatus for electrochemically depositing a material onto a workpiece surface | Ismail Emesh, Nikolay Korovin, Brian L. Mueller | 2003-06-03 |
| 6464855 | Method and apparatus for electrochemical planarization of a workpiece | Chris Barns | 2002-10-15 |
| 6328642 | Integrated pad and belt for chemical mechanical polishing | Anil K. Pant, Rahul Jairath, Kamal Mishra, Wilbur C. Krusell | 2001-12-11 |
| 6261155 | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher | Rahul Jairath, Jiri Pecen, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl | 2001-07-17 |
| 6146248 | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher | Rahul Jairath, Jiri Pecen, Wilbur C. Krusell, Jerauld J. Cutini, Erik H. Engdahl | 2000-11-14 |
| 6111634 | Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing | Jiri Pecen, John Fielden, Lloyd J. LaComb, JR., Rahul Jairath, Wilbur C. Krusell | 2000-08-29 |
| 6108091 | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing | Jiri Pecen, Rahul Jairath, Wilbur C. Krusell | 2000-08-22 |