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USPTO Patent Rankings Data through Dec 31, 2025
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Herbert E. Litvak — 24 Patents

LULuxtron: 11 patents #3 of 38Top 8%
LILightwind: 4 patents #2 of 3Top 70%
Lam Research: 4 patents #669 of 2,128Top 35%
XIXinix: 3 patents #1 of 11Top 10%
Palo Alto, CA: #1,027 of 9,675 inventorsTop 15%
California: #23,266 of 386,348 inventorsTop 7%
Overall (All Time): #168,038 of 4,157,543Top 5%
24 Patents All Time
Herbert E. Litvak has been granted 24 US patents while listed as an inventor at Luxtron. The first was granted in 1991 and the most recent in August 2009. Herbert E. Litvak ranks #168,038 of 4,157,543 US inventors in our database (top 4.0%). Patent records list Herbert E. Litvak in Palo Alto, CA, US.

Issued Patents All Time

Showing 1–24 of 24 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7580119 Method and apparatus for chemical monitoring Gary Powell 2009-08-25
7456939 Method and apparatus for chemical monitoring Gary Powell 2008-11-25
7217371 Optical control interface between controller and process chamber 2007-05-15
7072028 Method and apparatus for chemical monitoring Gary Powell 2006-07-04
6641470 Apparatus for accurate endpoint detection in supported polishing pads Eugene Zhao, Kang Jia, Michael D. Steiman, Christian D. Frederickson 2003-11-04 $25,527,000
6612902 Method and apparatus for end point triggering with integrated steering John M. Boyd 2003-09-02 $11,792,000
6426232 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 2002-07-30
6413147 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 2002-07-02
6254459 Wafer polishing device with movable window Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen 2001-07-03 $36,111,000
6110752 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 2000-08-29
6077452 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 2000-06-20
6068539 Wafer polishing device with movable window Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen 2000-05-30 $36,712,000
6027760 Photoresist coating process control with solvent vapor sensor Emir Gurer, Richard Savage 2000-02-22
6010538 In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link Mei Sun, Huey-Ming Tzeng, Daniel E. Glenn, Earl Jensen, Frank J. Hausman +1 more 2000-01-04
5946082 Interference removal Steven C. Leach, Edward G. Rodgers 1999-08-31
5891352 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 1999-04-06
5786886 Interference removal Steven C. Leach, Edward G. Rodgers 1998-07-28
5695660 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 1997-12-09
5499733 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment 1996-03-19
5414504 Interference removal Steven C. Leach, Edward G. Rodgers 1995-05-09
5308447 Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer Russell E. Lewis, Richard E. Howard 1994-05-03
5208644 Interference removal Steven C. Leach, Edward G. Rogers 1993-05-04
5190614 Method of endpoint detection and structure therefor Steven C. Leach, Jewett W. Fowler, Mariste A. Thomson 1993-03-02
5064269 Light collection method and apparatus Edward G. Rogers 1991-11-12