| 7580119 |
Method and apparatus for chemical monitoring |
Gary Powell |
2009-08-25 |
| 7456939 |
Method and apparatus for chemical monitoring |
Gary Powell |
2008-11-25 |
| 7217371 |
Optical control interface between controller and process chamber |
— |
2007-05-15 |
| 7072028 |
Method and apparatus for chemical monitoring |
Gary Powell |
2006-07-04 |
| 6641470 |
Apparatus for accurate endpoint detection in supported polishing pads |
Eugene Zhao, Kang Jia, Michael D. Steiman, Christian D. Frederickson |
2003-11-04 |
| 6612902 |
Method and apparatus for end point triggering with integrated steering |
John M. Boyd |
2003-09-02 |
| 6426232 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
2002-07-30 |
| 6413147 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
2002-07-02 |
| 6254459 |
Wafer polishing device with movable window |
Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen |
2001-07-03 |
| 6110752 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
2000-08-29 |
| 6077452 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
2000-06-20 |
| 6068539 |
Wafer polishing device with movable window |
Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen |
2000-05-30 |
| 6027760 |
Photoresist coating process control with solvent vapor sensor |
Emir Gurer, Richard Savage |
2000-02-22 |
| 6010538 |
In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link |
Mei Sun, Huey-Ming Tzeng, Daniel E. Glenn, Earl Jensen, Frank J. Hausman +1 more |
2000-01-04 |
| 5946082 |
Interference removal |
Steven C. Leach, Edward G. Rodgers |
1999-08-31 |
| 5891352 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
1999-04-06 |
| 5786886 |
Interference removal |
Steven C. Leach, Edward G. Rodgers |
1998-07-28 |
| 5695660 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
1997-12-09 |
| 5499733 |
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
— |
1996-03-19 |
| 5414504 |
Interference removal |
Steven C. Leach, Edward G. Rodgers |
1995-05-09 |
| 5308447 |
Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer |
Russell E. Lewis, Richard E. Howard |
1994-05-03 |
| 5208644 |
Interference removal |
Steven C. Leach, Edward G. Rogers |
1993-05-04 |
| 5190614 |
Method of endpoint detection and structure therefor |
Steven C. Leach, Jewett W. Fowler, Mariste A. Thomson |
1993-03-02 |
| 5064269 |
Light collection method and apparatus |
Edward G. Rogers |
1991-11-12 |
