Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7580119 | Method and apparatus for chemical monitoring | Gary Powell | 2009-08-25 |
| 7456939 | Method and apparatus for chemical monitoring | Gary Powell | 2008-11-25 |
| 7217371 | Optical control interface between controller and process chamber | — | 2007-05-15 |
| 7072028 | Method and apparatus for chemical monitoring | Gary Powell | 2006-07-04 |
| 6641470 | Apparatus for accurate endpoint detection in supported polishing pads | Eugene Zhao, Kang Jia, Michael D. Steiman, Christian D. Frederickson | 2003-11-04 |
| 6612902 | Method and apparatus for end point triggering with integrated steering | John M. Boyd | 2003-09-02 |
| 6426232 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 2002-07-30 |
| 6413147 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 2002-07-02 |
| 6254459 | Wafer polishing device with movable window | Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen | 2001-07-03 |
| 6110752 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 2000-08-29 |
| 6077452 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 2000-06-20 |
| 6068539 | Wafer polishing device with movable window | Rajeev Bajaj, Rahul Surana, Stephen Jew, Jiri Pecen | 2000-05-30 |
| 6027760 | Photoresist coating process control with solvent vapor sensor | Emir Gurer, Richard Savage | 2000-02-22 |
| 6010538 | In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link | Mei Sun, Huey-Ming Tzeng, Daniel E. Glenn, Earl Jensen, Frank J. Hausman +1 more | 2000-01-04 |
| 5946082 | Interference removal | Steven C. Leach, Edward G. Rodgers | 1999-08-31 |
| 5891352 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 1999-04-06 |
| 5786886 | Interference removal | Steven C. Leach, Edward G. Rodgers | 1998-07-28 |
| 5695660 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 1997-12-09 |
| 5499733 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | — | 1996-03-19 |
| 5414504 | Interference removal | Steven C. Leach, Edward G. Rodgers | 1995-05-09 |
| 5308447 | Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer | Russell E. Lewis, Richard E. Howard | 1994-05-03 |
| 5208644 | Interference removal | Steven C. Leach, Edward G. Rogers | 1993-05-04 |
| 5190614 | Method of endpoint detection and structure therefor | Steven C. Leach, Jewett W. Fowler, Mariste A. Thomson | 1993-03-02 |
| 5064269 | Light collection method and apparatus | Edward G. Rogers | 1991-11-12 |