Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7625692 | Yield and line width performance for liquid polymers and other materials | Ed C. Lee, Murthy Krishna, Reese Reynolds, John Salois, Royal Cherry | 2009-12-01 |
| 7255975 | Yield and line width performance for liquid polymers and other materials | Ed C. Lee, Murthy Krishna, Reese Reynolds, John Salois, Royal Cherry | 2007-08-14 |
| 7208262 | Yield and line width performance for liquid polymers and other materials | Ed C. Lee, Murthy Krishna, Reese Reynolds, John Salois, Royal Cherry | 2007-04-24 |
| 7030039 | Method of uniformly coating a substrate | Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow +5 more | 2006-04-18 |
| 6977098 | Method of uniformly coating a substrate | Tom Zhong, John Lewellen, Ed C. Lee, Robert P. Mandal, James C. Grambow +3 more | 2005-12-20 |
| 6955720 | Plasma deposition of spin chucks to reduce contamination of Silicon wafers | Ed C. Lee, Richard Savage | 2005-10-18 |
| 6911091 | Environment exchange control for material on a wafer surface | Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Scott C. Wackerman +1 more | 2005-06-28 |
| 6844027 | Environment exchange control for material on a wafer surface | Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Scott C. Wackerman +1 more | 2005-01-18 |
| 6780461 | Environment exchange control for material on a wafer surface | Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Scott C. Wackerman +1 more | 2004-08-24 |
| 6669779 | Yield and line width performance for liquid polymers and other materials | Ed C. Lee, Murthy Krishna, Reese Reynolds, John Salois, Royal Cherry | 2003-12-30 |
| 6662466 | Method for two dimensional adaptive process control of critical dimensions during spin coating process | Tom Zhong, John Lewellen, Eddie Lee | 2003-12-16 |
| 6468586 | Environment exchange control for material on a wafer surface | Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Scott C. Wackerman +1 more | 2002-10-22 |
| 6327793 | Method for two dimensional adaptive process control of critical dimensions during spin coating process | Tom Zhong, John Lewellen, Eddie Lee | 2001-12-11 |
| 6254936 | Environment exchange control for material on a wafer surface | Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Reese Reynolds +1 more | 2001-07-03 |
| 6248171 | Yield and line width performance for liquid polymers and other materials | Ed C. Lee, Murthy Krishna, Reese Reynolds, John Salois, Royal Cherry | 2001-06-19 |
| 6242364 | Plasma deposition of spin chucks to reduce contamination of silicon wafers | Ed C. Lee, Richard Savage | 2001-06-05 |
| 6238735 | Method of uniformly coating a substrate | Robert P. Mandal, James C. Grambow, Ted Dettes, Donald R. Sauer, Edmond R. Ward | 2001-05-29 |
| 6177133 | Method and apparatus for adaptive process control of critical dimensions during spin coating process | Richard Savage | 2001-01-23 |
| 6027760 | Photoresist coating process control with solvent vapor sensor | Herbert E. Litvak, Richard Savage | 2000-02-22 |
| 5670210 | Method of uniformly coating a substrate | Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward | 1997-09-23 |