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Wafer treatment for achieving defect-free self-assembled monolayers |
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Reducing substrate surface scratching using machine learning |
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Chang Ke, Liqi Wu, Lei Zhou, Shuyi Zhang, David Thompson +3 more |
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Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition |
Chang Ke, Song-Moon Suh, Liqi Wu, Lei Zhou, Biao Liu +3 more |
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Wafer treatment for achieving defect-free self-assembled monolayers |
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Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian +3 more |
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Larry Frazier, Cheng-Hsiung Tsai, John C. Forster, Mei Po (Mabel) Yeung |
2020-03-17 |
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Benjamin C. Wang, Joshua Collins, Avgerinos V. Gelatos, Amit Khandelwal |
2016-03-01 |
| 9017776 |
Apparatuses and methods for atomic layer deposition |
Hyman Lam, Bo Zheng, Hua Ai, Xiaoxiong Yuan, Hou Gong Wang +2 more |
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Anish Tolia, Tushar Mandrekar |
2002-04-23 |
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Method and apparatus for removing processing liquid from a processing liquid delivery line |
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2001-10-23 |
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Method for improved sputter etch processing |
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2000-05-02 |
