Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1071886 | Substrate support for a substrate processing chamber | Zhixiu Liang, Jiang Lu, Cheng-Hsiung Tsai, Tomoharu Matsushita, Zubin Huang | 2025-04-22 |
| 11835927 | Reducing substrate surface scratching using machine learning | Kartik Shah, Satish Radhakrishnan, Karthik Ramanathan, Karthikeyan Balaraman, Adolph Miller Allen +5 more | 2023-12-05 |
| 11735420 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2023-08-22 |
| 11586160 | Reducing substrate surface scratching using machine learning | Kartik Shah, Satish Radhakrishnan, Karthik Ramanathan, Karthikeyan Balaraman, Adolph Miller Allen +5 more | 2023-02-21 |
| 11515155 | Methods for enhancing selectivity in SAM-based selective deposition | Chang Ke, Liqi Wu, Lei Zhou, Shuyi Zhang, David Thompson +3 more | 2022-11-29 |
| 11033930 | Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition | Chang Ke, Song-Moon Suh, Liqi Wu, Lei Zhou, Biao Liu +3 more | 2021-06-15 |
| 10950433 | Methods for enhancing selectivity in SAM-based selective deposition | Chang Ke, Liqi Wu, Lei Zhou, Shuyi Zhang, David Thompson +3 more | 2021-03-16 |
| 10770292 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2020-09-08 |
| 10643840 | Selective deposition defects removal by chemical etch | Jeffrey W. Anthis, Chang Ke, Pratham Jain, Benjamin Schmiege, Guoqiang Jian +3 more | 2020-05-05 |
| 10593521 | Substrate support for plasma etch operations | Larry Frazier, Cheng-Hsiung Tsai, John C. Forster, Mei Po (Mabel) Yeung | 2020-03-17 |
| 9275865 | Plasma treatment of film for impurity removal | Benjamin C. Wang, Joshua Collins, Avgerinos V. Gelatos, Amit Khandelwal | 2016-03-01 |
| 9017776 | Apparatuses and methods for atomic layer deposition | Hyman Lam, Bo Zheng, Hua Ai, Xiaoxiong Yuan, Hou Gong Wang +2 more | 2015-04-28 |
| 8747556 | Apparatuses and methods for atomic layer deposition | Hyman Lam, Bo Zheng, Hua Ai, Xiaoxiong Yuan, Hougong Wang +2 more | 2014-06-10 |
| 8637410 | Method for metal deposition using hydrogen plasma | Anantha K. Subramani, John C. Forster, Seshadri Ganguli, Xinliang Lu, Wei Wang +2 more | 2014-01-28 |
| 8293015 | Apparatuses and methods for atomic layer deposition | Hyman Lam, Bo Zheng, Hua Ai, Xiaoxiong Yuan, Hougong Wang +2 more | 2012-10-23 |
| 8291857 | Apparatuses and methods for atomic layer deposition | Hyman Lam, Bo Zheng, Hua Ai, Xiaoxiong Yuan, Hou Gong Wang +2 more | 2012-10-23 |
| 7705275 | Substrate support having brazed plates and resistance heater | Salvador P. Umotoy, Lawrence Chung-Lai Lei, Gwo-chun Tzu, Xiangxiong (John) Yuan, Hymam Lam | 2010-04-27 |
| 6375753 | Method and apparatus for removing processing liquid from a processing liquid delivery line | Anish Tolia, Tushar Mandrekar | 2002-04-23 |
| 6305392 | Method and apparatus for removing processing liquid from a processing liquid delivery line | Anish Tolia, Tushar Mandrekar | 2001-10-23 |
| 6057244 | Method for improved sputter etch processing | Gilbert Hausmann, Vijay D. Parkhe, Chia-Ao William LU | 2000-05-02 |