| 9783889 |
Apparatus for variable substrate temperature control |
Gwo-Chuan Tzu, Xiaoxiong Yuan, Avgerinos V. Gelatos, Olkan Cuvalci, Kai Wu +1 more |
2017-10-10 |
| 9546419 |
Method of reducing tungsten film roughness and resistivity |
Avgerinos V. Gelatos |
2017-01-17 |
| 9275865 |
Plasma treatment of film for impurity removal |
Benjamin C. Wang, Joshua Collins, Michael S. Jackson, Avgerinos V. Gelatos |
2016-03-01 |
| 8920564 |
Methods and apparatus for thermal based substrate processing with variable temperature capability |
Gwo-Chuan Tzu, Xiaoxiong Yuan, Benjamin C. Wang, Avgerinos V. Gelatos, Kai Wu +3 more |
2014-12-30 |
| 8563424 |
Process for forming cobalt and cobalt silicide materials in tungsten contact applications |
Seshadri Ganguli, Sang Ho Yu, See-Eng Phan, Mei Chang, Hyoung-Chan Ha |
2013-10-22 |
| 8551880 |
Ammonia-based plasma treatment for metal fill in narrow features |
Bencherki Mebarki, Linh Thanh |
2013-10-08 |
| 8513116 |
Atomic layer deposition of tungsten materials |
Madhu Moorthy, Avgerinos V. Gelatos, Kai Wu |
2013-08-20 |
| 8211799 |
Atomic layer deposition of tungsten materials |
Madhu Moorthy, Avgerinos V. Gelatos, Kai Wu |
2012-07-03 |
| 8187970 |
Process for forming cobalt and cobalt silicide materials in tungsten contact applications |
Seshadri Ganguli, Sang Ho Yu, See-Eng Phan, Mei Chang, Hyoung-Chan Ha |
2012-05-29 |
| 8071478 |
Method of depositing tungsten film with reduced resistivity and improved surface morphology |
Kai Wu, Averginos V. Gelatos |
2011-12-06 |
| 7964505 |
Atomic layer deposition of tungsten materials |
Madhu Moorthy, Avgerinog V. Gelatos, Kai Wu |
2011-06-21 |
| 7838441 |
Deposition and densification process for titanium nitride barrier layers |
Avgerinos V. Gelatos, Christophe Marcadal, Mei Chang |
2010-11-23 |
| 7745333 |
Methods for depositing tungsten layers employing atomic layer deposition techniques |
Ken Kaung Lai, Ravi Rajagopalan, Madhu Moorthy, Srinivas Gandikota, Joseph Castro +9 more |
2010-06-29 |
| 7732327 |
Vapor deposition of tungsten materials |
Sang-Hyeob Lee, Avgerinos V. Gelatos, Kai Wu, Ross Marshall, Emily Renuart +2 more |
2010-06-08 |
| 7691442 |
Ruthenium or cobalt as an underlayer for tungsten film deposition |
Srinivas Gandikota, Madhu Moorthy, Avgerinos V. Gelatos, Mei Chang, Kavita Shah +1 more |
2010-04-06 |
| 7521379 |
Deposition and densification process for titanium nitride barrier layers |
Avgerinos V. Gelatos, Christophe Marcadal, Mei Chang |
2009-04-21 |
| 7514353 |
Contact metallization scheme using a barrier layer over a silicide layer |
Timothy Weidman, Kapila Wijekoon, Zhize Zhu, Avgerinos V. Gelatos, Arulkumar Shanmugasundram +3 more |
2009-04-07 |
| 7429402 |
Ruthenium as an underlayer for tungsten film deposition |
Srinivas Gandikota, Madhu Moorthy, Avgerinos V. Gelatos, Mei Chang, Kavita Shah +1 more |
2008-09-30 |
| 7405158 |
Methods for depositing tungsten layers employing atomic layer deposition techniques |
Ken Kaung Lai, Ravi Rajagopalan, Madhu Moorthy, Srinivas Gandikota, Joseph Castro +9 more |
2008-07-29 |
